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Pure and Al-doped Zin Oxide ZnO (AZO) thin films with different aluminum (Al) concentrations (0.5, 1, 2, and 3 at.%) were prepared on glass substrates by a dip-coating technique using different Zn and Al precursors. The structural, morphological, optical and electrical properties of these films were investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive spectrometer (EDS), Atomic force electron microscopy, ultraviolet–visible spectrophotometry, photoluminescence (PL) spectroscopy and four-point probe technique. XRD results showed that the obtained AZO thin films were polycrystalline with a highly c-axis preferred (002) orientation, and the average crystallites size decreased from 29 to 25 nm with the increase in Al doping concentration. EDS microanalysis confirmed the presence of Zn, O and Al elements in the prepared films as expected. The optical study demonstrated that the ZnO thin film had a good transparency in the visible range with a maximum transmittance of 90% and the band gaps varied from 3.16 to 3.26 eV by Al doping. SEM micrographs showed a wrinkles-like morphology of the thin films that changed in density with the increase of Al concentrations. The PL emission spectra indicated that except the thin film doped with 1 at.%, other films exhibited high emission intensities under an excitation of 325 nm which allows to apply them as downconversion layers for solar cell applications. [ABSTRACT FROM AUTHOR]

In this work, we have prepared the undoped and Al-doped ZnO thin films by a homemade spray pyrolysis method at 450°C onto glass substrates. The X-ray diffraction patterns of undoped ZnO and aluminized zinc-oxide (AZO) thin films exhibit hexagonal wurtzite crystal structure with high crystalline quality, the crystallite size is nanometric. The morphology of the undoped and Al-doped ZnO thin films also indicate that all samples have a nanoscale grain size around 50 nm, and the microstructure of ZnO films is highly influenced by the aluminum doping. The two films are characterized by UV-visible spectrophotometry showing that the films have a whole optical transmission above 85% in the visible range. The composition of our films is obtained by energy dispersive spectrum, confirmed by Auger electron spectroscopy (AES) and by Rutherford back-scattering spectrometry (RBS) techniques. [ABSTRACT FROM AUTHOR]

This paper reports the effect of Fe incorporation on structural and electro-optical properties of ZnO thin films prepared by spin coating techniques. The Fe/Zn nominal volume ratio was 7 % in the solution. X-ray diffraction patterns of the films showed that doped incorporation leads to substantial changes in the structural characteristics of ZnO films. All the films have polycrystalline structure, with a preferential growth along the ZnO (002) plane. The crystallite size was calculated using a well-known Scherrer’s formula and found to be in the range of 22-17 nm. The highest average optical transmittance value in the visible region was belonging to the Fe doped ZnO film. The results of the Raman scattering confirmed the observations of XRD and UV-Vis analysis techniques by the appearance of these occupancies at Zn+2 sites. These results are explained theoretically and are compared with those reported by other workers. The results of Hall measurement of ZnO and ZnO:Fe thin films reveal a high electron concentration around 1016 cm–3 and low mobility 2.6 cm2/Vs. All as-grown samples show ambiguous carrier conductivity type (p-type and ntype) in the automatic Van der Pauw Hall measurement. A similar result has been observed in Li-doped ZnO and in As-doped ZnO films by other groups before. However, by characterizing our samples whit XPS, we have demonstrated that the ambiguous carrier type n in intended our ZnO films is not intrinsic behavior of the samples. It is due to the persistent photoconductivity effect in ZnO. [ABSTRACT FROM AUTHOR]