10 results on '"Yamauchi, Kazuto"'
Search Results
2. Global High-Accuracy Intercomparison of Slope Measuring Instruments.
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Siewert, Frank, Assoufid, Lahsen, Cocco, Daniele, Hignette, Olivier, Irick, Steve, Lammert, Heiner, McKinney, Wayne, Ohashi, Haruhiko, Polack, Francois, Shinan Qian, Seungyu Rah, Rommeveaux, Amparo, Schönherr, Veit, Sostero, Giovani, Takacs, Peter, Thomasset, Muriel, Yamauchi, Kazuto, Yashchuk, Valeriy, and Zeschke, Thomas
- Subjects
SYNCHROTRON radiation ,ELECTROMAGNETIC waves ,PARTICLES (Nuclear physics) ,METROLOGY ,OPTICS - Abstract
The upcoming generation of high accuracy synchrotron radiation (SR) optics will be characterized by a slope deviation from ideal shape in the range of some 0.05μrad rms at a sampling interval of about 1mm. To certify and improve the measurement capabilities of metrology tools to inspect these stringent specifications, an essential step is a worldwide intercomparison of these measurements based on a set of transfer standards. It is the aim of these cross measurements to verify the “absolute” correctness and comparability of the measurement results obtained by the cooperating partners when measuring the topography of specific reference optics (ROs) using their latest metrology tools and methods. Organized by members of the SR-optics community, new national and international cross measurement comparisons of typical synchrotron radiation mirrors have been realized during the last few years: A round robin test by the European COST-program (BESSY, Elettra, ESRF, Soleil) during the years 2004–2005 and a similar cooperation realized by the APS, ESRF and Spring-8 have proceeded. The first results of both projects were presented at the “Optics & Photonics” conference in San Diego in August 2005. This work build upon earlier work. The participants of both groups and representatives of other SR-laboratories agreed to start a global cooperation bringing together the two round-robin projects and open these activities to other partners from the SR-community, optical manufacturers and other interested parties. This initiative is intended to start an extensive comparison of various measurement principles and tools and will help to push the frontiers in metrology, and hence production, to a precision well below the current state-of-the-art limit of 0.5μrad rms for slope errors. © 2007 American Institute of Physics [ABSTRACT FROM AUTHOR]
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- 2007
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3. Relative angle determinable stitching interferometry for hard x-ray reflective optics.
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Mimura, Hidekazu, Yumoto, Hirokatsu, Matsuyama, Satoshi, Yamamura, Kazuya, Sano, Yasuhisa, Ueno, Kazumasa, Endo, Katsuyoshi, Mori, Yuzo, Yabashi, Makina, Tamasaku, Kenji, Nishino, Yoshinori, Ishikawa, Tetsuya, and Yamauchi, Kazuto
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INTERFEROMETRY ,X-ray optics ,SURFACES (Physics) ,ELLIPTIC curves ,NANOSTRUCTURED materials ,OPTICAL measurements - Abstract
Metrology plays an important role in surface figuring with subnanometer accuracy. We have developed relative angle determinable stitching interferometry for the surface figuring of elliptical mirrors, in order to realize hard x-ray nanofocusing. In a stitching system, stitching angles are determined not by the general method using a common area between neighboring shots, but by the new method using the mirror’s tilt angles measured at times when profile data are acquired. The high measurement accuracy of approximately 4 nm (peak-to-valley) was achieved in the measurement of a cylindrical surface having the same curvature as the elliptically designed shape to enable hard x-ray nanofocusing. [ABSTRACT FROM AUTHOR]
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- 2005
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4. Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining.
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Yamauchi, Kazuto, Mimura, Hidekazu, Inagaki, Kouji, and Mori, Yuzo
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PROGRAMMING of numerically controlled machine tools , *X-ray optics - Abstract
A numerically controlled elastic emission machining (EEM) system has been developed to fabricate ultraprecise optical components, particularly in x-ray optics. Nozzle-type EEM heads, by which a high shear-rate flow of ultrapure water can be generated on the work surface, have been newly proposed to transport the fine powder particles to the processing surface. Using this type of EEM head, the obtainable spatial resolution in figure correction can be changed by selecting the suitable aperture size of the nozzle according to the required spatial frequency. As a result of test figuring, 1 nm level peak-to-valley (p-v) accuracy is achieved throughout the entire spatial wavelength range longer than 0.3 mm. In addition, the microroughness of the processed surface is certified to also be approximately 1 nm (p-v). [ABSTRACT FROM AUTHOR]
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- 2002
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5. Ray-tracing analysis in aberration of a laterally- graded multilayer mirror
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Mimura, Hidekazu, Handa, Soichiro, Morawe, Christian, Yokoyama, Hikaru, Kimura, Takashi, Matsuyama, Satoshi, and Yamauchi, Kazuto
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RAY tracing algorithms , *MIRRORS , *MULTILAYERED thin films , *SURFACES (Technology) , *X-ray optics , *NUMERICAL analysis - Abstract
Abstract: A laterally- graded multilayer mirror, which has a multilayer film on a curved surface substrate, is one of the candidates of focusing elements producing an ultimate hard-X-ray beam. Aberration, which multilayer mirrors natively have, should be seriously considered when we challenge several nanometer-size X-ray beams. X-rays, inserting a multilayer structure, are reflected at a relatively large angle by the effect of interferences among X-rays slightly reflected on each boundary. However, if focal points of X-rays reflected at bottom boundary and uppermost surfaces might be different, the X-rays are not allowed to be focused at the same point. This is due to refractions inside the multilayer film. Now, there is no rigorous numerical method to determine clearly the behavior of such reflection of X-rays. In this study, we code a ray-tracing simulator to analyze such aberration effect and carry out several simulations. The results conclude that aberration of an ideal laterally- graded multilayer mirror has insignificant effects on the focused beam size. [Copyright &y& Elsevier]
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- 2010
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6. A stitching figure profiler of large X-ray mirrors using RADSI for subaperture data acquisition
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Kimura, Takashi, Ohashi, Haruhiko, Mimura, Hidekazu, Yamakawa, Daisuke, Yumoto, Hirokatsu, Matsuyama, Satoshi, Tsumura, Takashi, Okada, Hiromi, Masunaga, Tatsuhiko, Senba, Yasunori, Goto, Shunji, Ishikawa, Tetsuya, and Yamauchi, Kazuto
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X-ray optics , *MIRRORS , *SYNCHROTRON radiation , *NUCLEAR facilities , *COHERENCE (Optics) , *INTERFEROMETERS - Abstract
Abstract: In the third- and coming fourth-generation synchrotron radiation facilities, X-rays having both high brightness and high coherency can be utilized. Such X-rays require high accuracy in the reflective optics. In this study, we developed an ultra-precise measurement instrumentation for tangentially long X-ray mirrors using a Fizeau interferometer. In the system, the mirror figure is measured by stitching the subaperture profiles measured by the relative-angle determinable stitching interferometry, which we developed previously. High measurement accuracy of approximately 2nm (peak to valley) was achieved in the measurement of a 400mm-long aspherical surface. [Copyright &y& Elsevier]
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- 2010
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7. Two-dimensional measurement of focused hard X-ray beam profile using coherent X-ray diffraction of isolated nanoparticle
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Takahashi, Yukio, Kubo, Hideto, Tsutsumi, Ryosuke, Sakaki, Shigeyuki, Zettsu, Nobuyuki, Nishino, Yoshinori, Ishikawa, Tetsuya, and Yamauchi, Kazuto
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PHYSICAL measurements , *X-ray optics , *COHERENCE (Physics) , *X-ray diffraction , *NANOPARTICLES , *SYNCHROTRON radiation - Abstract
Abstract: A method for evaluating the two-dimensional photon density distribution in focused hard X-ray beams is proposed and demonstrated in a synchrotron experiment at SPring-8. A synchrotron X-ray beam of 11.8keV is focused to a spot by Kirkpatrick–Baez mirrors. The two-dimensional intensity distribution of the focused beam is derived by monitoring the forward diffracted intensity from an isolated silver nanocube with an edge length of positioned in the beam waist, which is two-dimensionally scanned. Furthermore, the photon density of X-rays illuminated onto the nanocube is estimated by utilizing coherent X-ray diffraction microscopy. This method is useful for evaluating the photon density distribution of hard X-ray beams focused to a spot size of less than a few micrometers. [Copyright &y& Elsevier]
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- 2010
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8. Extended knife-edge method for characterizing sub-10-nm X-ray beams
- Author
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Handa, Soichiro, Kimura, Takashi, Mimura, Hidekazu, Yumoto, Hirokatsu, Matsuyama, Satoshi, Sano, Yasuhisa, Tamasaku, Kenji, Nishino, Yoshinori, Yabashi, Makina, Ishikawa, Tetsuya, and Yamauchi, Kazuto
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X-ray optics , *BEAM optics , *SCANNING systems , *GEOMETRICAL optics , *NUMERICAL analysis , *SIGNAL processing - Abstract
Abstract: We describe a method for characterizing sub-10-nm X-ray beams using knife-edge scanning with dark-field geometry. Beam profile measurement by the conventional dark-field method is simulated numerically, and the signal intensity is found to depend strongly on the incident angle of the beam components. A numerical procedure to correct the dependence and to determine the actual beam profile is presented. [Copyright &y& Elsevier]
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- 2010
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9. Stitching-angle measurable microscopic-interferometer: Surface-figure metrology tool for hard X-ray nanofocusing mirrors with large curvature
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Yumoto, Hirokatsu, Mimura, Hidekazu, Handa, Soichiro, Kimura, Takashi, Matsuyama, Satoshi, Sano, Yasuhisa, Ohashi, Haruhiko, Yamauchi, Kazuto, and Ishikawa, Tetsuya
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INTERFEROMETERS , *SURFACES (Technology) , *METROLOGY , *X-ray optics , *MIRROR design & construction , *PROFILOMETER , *PERFORMANCE evaluation , *RELIABILITY in engineering - Abstract
Abstract: We propose an optical profilometer system for evaluating mirrors that are used for hard X-ray nanofocusing. A surface metrology system designed for these mirrors to focus to a size of 10nm is required to ensure a precise measurement of a large curvature with a vertical accuracy of 1nm and a lateral resolution less than 0.1mm. The surface metrology system is based on a stitching interferometer that can determine stitching angles between adjacent local surface profiles. Local surface profiles and stitching angles are detected simultaneously by using two types of optical interferometers, a microscopic interferometer and a large-scale interferometer, respectively. We developed a nanofocusing mirror that has approximately the same surface curvature as a sub-10-nm focusing mirror, to examine the measurement accuracy of the developed surface metrology system. As a result of a performance assessment of the measurement instrument, we achieved measurement reproducibility and reliability of less than peak-to-valley height of 4nm by measuring the focusing mirror. In addition, we achieved focusing performance of a full width at half maximum 27nm at 7keV using the mirror at SPring-8. We verified that the metrology system can be used to measure sub-10-nm focusing mirrors. [Copyright &y& Elsevier]
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- 2010
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10. New X-ray microprobe system for trace heavy element analysis using ultraprecise X-ray mirror optics of long working distance
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Terada, Yasuko, Yumoto, Hirokatsu, Takeuchi, Akihisa, Suzuki, Yoshio, Yamauchi, Kazuto, and Uruga, Tomoya
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X-ray optics , *MICROPROBE analysis , *TRACE elements , *MIRRORS , *HEAVY elements , *POTENTIAL theory (Physics) - Abstract
Abstract: A new X-ray microprobe system for trace heavy element analysis using ultraprecise X-ray mirror optics of 300mm long working distance has been developed at beamline 37XU of SPring-8. A focusing test has been performed in the X-ray energy range 20–37.7keV. A focused beam size of 1.3μm (V)×1.5μm (H) has been achieved at an X-ray energy of 30keV, and a total photon flux of the focused beam was about 2.7×1010 photons/s. Micro-X-ray fluorescence (μ-XRF) analysis of eggplant roots has been carried out using the developed microprobe. It is clearly observed in the XRF images that cadmium is highly accumulated in the endodermis, exodermis and epidermis of roots. This study demonstrates the potential of scanning microscopy for heavy elements analysis in the high-energy X-ray region. [Copyright &y& Elsevier]
- Published
- 2010
- Full Text
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