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The paper proposes an X-ray optical scheme of a lithograph with a transmissive dynamic mask and a synchrotron radiation source. The image of a dynamic mask in the form of holes of small diameter is transferred with a decrease to a plate with a resist using a Schwarzschild projection lens. The formation of a topological pattern will occur due to the coordinated operation of the system for scanning a plate with a resist and a microelectromechanical system of a transmissive type. Objectives with a reduction of 10 and 20 times for obtaining 10–20 nm images of 200 nm holes of the dynamic mask are considered. The scheme of illumination of the mask is calculated, which provides uniform illumination on a field of 10 × 10 mm2. For the synchrotron Siberia-2 of the KISI on a bending magnet, the expected productivity of the lithograph will be up to 1/14 of a plate with a diameter of 100 mm per hour. [ABSTRACT FROM AUTHOR]

In the design of a W/C multilayer mirror, we applied a trilayer model to consider the interdiffusion of tungsten and carbon on the W-on-C interface and investigated the first Bragg angle and its reflectivity. As the interdiffusion thickness of a W/C multilayer mirror increased, the first Bragg angle and the reflected X-ray energy increased. However, as the period thickness of the W/C multilayer mirror increased, the effects of the interdiffusion became less pronounced. The criteria for the use of either the bilayer or the trilayer models for the design of W/C multilayer mirrors were presented for various period thicknesses. The trilayer model would be useful for the design of multilayer mirrors with a small period thickness of less than approximately 4.0 nm at an interdiffusion of 0.28 nm. [ABSTRACT FROM AUTHOR]

Advances in resonant inelastic X-ray scattering (RIXS) have come in lockstep with improvements in energy resolution. Currently, the best energy resolution at the Ir L3-edge stands at ∼25 meV, which is achieved using a diced Si(844) spherical crystal analyzer. However, spherical analyzers are limited by their intrinsic reflection width. A novel analyzer system using multiple flat crystals provides a promising way to overcome this limitation. For the present design, an energy resolution at or below 10 meV was selected. Recognizing that the angular acceptance of flat crystals is severely limited, a collimating element is essential to achieve the necessary solid-angle acceptance. For this purpose, a laterally graded, parabolic, multilayer Montel mirror was designed for use at the Ir L3-absorption edge. It provides an acceptance larger than 10 mrad, collimating the reflected X-ray beam to smaller than 100 µrad, in both vertical and horizontal directions. The performance of this mirror was studied at beamline 27-ID at the Advanced Photon Source. X-rays from a diamond (111) monochromator illuminated a scattering source of diameter 5 µm, generating an incident beam on the mirror with a well determined divergence of 40 mrad. A flat Si(111) crystal after the mirror served as the divergence analyzer. From X-ray measurements, ray-tracing simulations and optical metrology results, it was established that the Montel mirror satisfied the specifications of angular acceptance and collimation quality necessary for a high-resolution RIXS multi-crystal analyzer system. [ABSTRACT FROM AUTHOR]

We describe the distinction between the operation of a short focal length x-ray microscope forming a real image with a laboratory source (convergent illumination) and with a highly collimated intense beam from a synchrotron light source (Köhler illumination). We demonstrate the distinction with a Kirkpatrick-Baez microscope consisting of short focal length multilayer mirrors operating at an energy of 8 keV. In addition to realizing improvements in the resolution of the optics, the synchrotron radiation microscope is not limited to the usual single magnification at a fixed image plane. Higher magnification images are produced by projection in the limit of geometrical optics with a collimated beam. However, in distinction to the common method of placing the sample behind the optical source of a diverging beam, we describe the situation in which the sample is located in the collimated beam before the optical element. The ultimate limits of this magnification result from diffraction by the specimen and are determined by the sample position relative to the focal point of the optic. We present criteria by which the diffraction is minimized. [ABSTRACT FROM AUTHOR]

This paper is an overview of the research activities carried out in the past five years at the Institute for Physics of Microstructures RAS and “X-ray” Company towards the manufacture of multilayer mirror systems capable of forming X-ray beams in the subnanometer range of wavelengths. The systems fabrication technology is presented, including techniques for producing supersmooth surfaces of specified shape, methods of graded multilayer structure deposition on such surfaces, and the principles of designing optimal mirror parameters. The characteristics of a quadrelliptical reflector—a novel high light-gathering power four-corner focusing system—are reported. [ABSTRACT FROM AUTHOR]

Abstract: A method for manufacturing a reflecting system for focussing the radiation of a quasipoint X-ray source in the hard range of wavelengths () is proposed. The system consists of four identical multilayer mirrors having the form of an elliptical cylinder. Cylinder generatrixes of the adjoining mirrors are mutually perpendicular. The angular aperture of the system is steradian. [Copyright &y& Elsevier]