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Series of In x Ga 1-x As/GaAs structures with indium vapor composition ranging from 13 to 100%, denoted samples A, B, C and D, were grown by metalorganic vapor phase epitaxy (MOVPE) at 450 °C and in situ monitored by spectral reflectance (SR). In order to contribute to the enhancement of crystal quality and to understand growth kinetic of In x Ga 1-x As/GaAs structures, the dependence of structural and morphological properties on indium composition x was studied. Basing on high resolution x-ray diffraction (HRXRD) measurements, solid indium compositions x of samples A, B, C and D were determined. Also, the evolution of structural quality (dislocations density, grain size, etc.) as a function of indium composition x was quantified. Besides, morphological properties (hatching and islands formations, densities, sizes and uniformities, RMS surface roughness, etc.) and growth process (growth anisotropy, etc.) versus indium composition x were examined using atomic force microscopy (AFM) analysis. Also, reflectance three-dimensional plot as function of time and wavelength was recorded to quantify the evolution of reflectivity in the wavelength range from 400 to 1000 nm and to determine some growth parameters such as growth rates and thicknesses of In x Ga 1-x As samples. A good correlation between experimental results issued from different characterizations tools was obtained. [ABSTRACT FROM AUTHOR]

GaAs/In x Ga 1 − x As/GaAs strained and partially relaxed structures were grown by metalorganic vapor phase epitaxy and in situ monitored by laser reflectometry (LR). Two structures were formed by a single In x Ga 1 − x As layer, and the third comprises three superposed In x Ga 1 − x As layers having increasing indium contents. LR plots as function of time were recorded to extract growth rates and thicknesses of active and cap layers. In order to study the strain effect on structural and optical properties of these heterostructures, high resolution X-ray diffraction (HRXRD) and photoreflectance (PR) measurements were performed. HRXRD curves are developed to calculate strain tensor components, indium composition, and thicknesses of strained and partially relaxed layers. Besides, valence-band splitting and band-gap energy shift were measured by best fitting PR spectra at 300 K. Experimental energy values determined as a function of indium composition and relaxation rate were compared to those obtained by the elastic strain theory. For single and superposed In x Ga 1 − x As active layers, a good correlation between experimental results and theoretical predictions was obtained. [ABSTRACT FROM AUTHOR]

Abstract: In x Ga1−x As/GaAs pseudomorphic structures were grown by metalorganic vapor phase epitaxy. Reciprocal space mapping were recorded in the vicinity of (004) and (115) nodes using high resolution X-ray diffraction (HRXRD) in order to determine strain tensor components, indium compositions and thicknesses of alloys. Near-infrared photoluminescence (PL) was performed at 10K. The impact of strain on PL response was revealed by peak energy positions and line width. In addition, valence-band splitting (VBS) and the shift of the heavy-hole were measured. Besides, photoreflectance (PR) at room temperature was useful to establish experimentally the dependence of VBS and band energy shifts (E 0 and E 0+∆ 0) on elastic strain due to lattice mismatches. Other parameters such as the internal electric-field and the electro-optical energy were determined from Franz–Keldysh oscillations analysis. Good correlation between the results obtained from all investigated techniques and theoretical predictions was confirmed. [Copyright &y& Elsevier]