1. Spatial light modulator for maskless optical projection lithography.
- Author
-
Watson, G. P., Aksyuk, V., Simon, M. E., Tennant, D. M., Cirelli, R. A., Mansfield, W. M., Pardo, F., Lopez, D. O., Bolle, C. A., Papazian, A. R., Basavanhally, N., Lee, J., Fullowan, R., Klemens, F., Miner, J., Kornblit, A., Sorsch, T., Fetter, L., Peabody, M., and Bower, J. E.
- Subjects
LIGHT modulators ,MASKS (Electronics) ,LITHOGRAPHY ,MICROELECTROMECHANICAL systems ,POLYCRYSTALLINE semiconductors ,WAVELENGTHS ,EXCIMER lasers - Abstract
Spatial light modulators (SLMs) designed to replace photomasks for optical lithography have been designed, fabricated, and tested. These microelectromechanical devices are fabricated with alternating polycrystalline Si and sacrificial SiO
2 layers that are patterned by a 193 nm wavelength scanner to dimensions as small as 150 nm. Aerial image simulations were used to define the mechanical requirements of the devices. Piston motion of electrically actuated devices was measured with an optical profilometer. The measurements were fit to a simple equation to within 1 nm precision, which is adequate for defining 50 nm features lithographically. Transient response measurements show that one version of the SLM responds to actuation as quickly as 20 μs, fast enough for current 193 nm wavelength excimer laser sources. [ABSTRACT FROM AUTHOR]- Published
- 2006
- Full Text
- View/download PDF