Search

The article presents a direct grating writing technique that allows simultaneous ultraviolet (UV) definition of channel wave guides with integral Bragg gratings in a photosensitive planar media. Based on a small-spot interference pattern generated by two focused UV-writing beams, the single-step approach was developed to promote optimal use of sample photosensitivity for both the wave guide geometry and Bragg grating superstructure, with the potential for implementing many aspects of advanced grating design, such as chirp and apodisation, without the need for a phase mask.

A method for fabricating planar silica substrates via modified chemical vapour deposition (MCVD) and a modified fibre drawing technique is presented. Long lengths of planar material are generated from a single substrate offering a potentially low-cost alternative to existing planar substrate deposition processes. Buried straight and splitting waveguide channels, as well as Bragg gratings, are inscribed in the planar material using direct UV-writing technology, and the results are reported. [ABSTRACT FROM AUTHOR]