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This study aimed to comprehensively understand the performance and degradation of both p- and n-channel vertical double diffused MOS (VDMOS) transistors under bias temperature stress. Conducted experimental investigations involved various stress conditions and annealing processes to analyze the impacts of BT stress on the formation of oxide trapped charge and interface traps, leading to threshold voltage shifts. Findings revealed meaningful threshold voltage shifts in both PMOS and NMOS devices due to stresses, and the subsequent annealing process was analyzed in detail. The study also examined the influence of stress history on self-heating behavior under real operating conditions. Additionally, the study elucidated the complex correlation between stress-induced degradation and device reliability. The insights contribute to optimizing the performance and permanence of VDMOS transistors in practical applications, advancing semiconductor technology. This study underscored the importance of considering stress-induced effects on device reliability and performance in the design and application of VDMOS transistors. [ABSTRACT FROM AUTHOR]

In this study we investigate the dynamic recovery effects in IRF9520 commercial p-channel power vertical double diffused metal–oxide semiconductor field-effect transistors (VDMOSFETs) subjected to negative bias temperature (NBT) stressing under the particular pulsed bias. Particular values of the pulsed stress voltage frequency and duty cycle are chosen in order to analyze the recoverable and permanent components of stress-induced threshold voltage shift in detail. The results are discussed in terms of the mechanisms responsible for buildup of oxide charge and interface traps. The partial recovery during the low level of pulsed gate voltage is ascribed to the removal of recoverable component of degradation, i.e., to passivation/neutralization of shallow oxide traps that are not transformed into the deeper traps (permanent component). Considering the value of characteristic time constant associated with complete removal of the recoverable component of degradation, it is shown that by selecting an appropriate combination of the frequency and duty cycle, the threshold voltage shifts induced under the pulsed negative bias temperature stress conditions can be significantly reduced, which may be utilized for improving the device lifetime in real application circuits. [ABSTRACT FROM AUTHOR]

In this paper, the effects of successively applied static/pulsed negative bias temperature (NBT) stress and irradiation on commercial p-channel power vertical double-diffused metal-oxide semiconductor (VDMOS) transistors are investigated. To further illustrate the impacts of these stresses on the power devices, the relative contributions of gate oxide charge ( N ot ) and interface traps ( N it ) to threshold voltage shifts are shown and studied. It was shown that when irradiation without gate voltage is used, the duration of the pre-irradiation static NBT stress has a slightly larger effect on the radiation response of power VDMOS transistors. Regarding the fact that the investigated components are more likely to function in the dynamic mode than the static mode in practice, additional analysis was focused on the results obtained during the pulsed NBT stress after irradiation. For the components subjected to the pulsed NBT stress after the irradiation, the effects of N ot neutralization and N it passivation (usually related to annealing) are more enhanced than the components subjected to the static NBT stress, because only a high temperature is applied during the pulse-off state. It was observed that in devices previously irradiated with gate voltage applied, the decrease of threshold voltage shift is significantly greater during the pulsed NBT stress than during the static NBT stress. [ABSTRACT FROM AUTHOR]