1. Optimizing the thermal annealing temperature: technological route for tuning the photo-detecting property of p-CuO thin films grown by chemical bath deposition method.
- Author
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Sultana, Jenifar, Paul, Somdatta, Karmakar, Anupam, Dalapati, Goutam K., and Chattopadhyay, Sanatan
- Subjects
THIN films ,CHEMICAL solution deposition ,PHOTODETECTORS ,OPTOELECTRONICS ,DIELECTRIC films - Abstract
In the current work, CuO thin films (~ 110 nm) are grown by employing chemical bath deposition (CBD) method on Si substrate for fabricating the p-CuO/n-Si heterojunction photodetectors. The as-grown films are annealed at 250, 550 and 850 °C for 10 min in Ar ambient for tuning optoelectronic properties of the as-grown CuO thin films. Comparative study on systematic annealing of the film within 250-550 °C indicates a morphological change of the as-grown CuO film to nano-fiber type with its chemical composition remaining unchanged. A variation of refractive index and dielectric constant in the range of 2.65-2.93 and 7.2-9.7, and a change of absorption coefficient and bandgap from 1.33 × 10
5 to 6.06 × 105 cm− 1 and 1.5 to 2.16 eV have been observed. The current-voltage characteristics both in dark and illuminated conditions suggest that the annealing of CuO film at 550 °C provides the best performance in terms of photo-to-dark current ratio and photoresponsivity. A respective enhancement of 5.07 and 10% for the photo-to-dark ratio and photoresponsivity has been observed for the 550 °C annealed sample. [ABSTRACT FROM AUTHOR]- Published
- 2018
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