1. High throughput physical vapor deposition growth of Pb(ZrxTi1-x)O3 perovskite thin films growth on silicon substrates.
- Author
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Bakaimi, Ioanna, Hayden, Brian E., Mitchell, Colin J., and Mashanovich, Goran Z.
- Subjects
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PHYSICAL vapor deposition , *THIN films , *LEAD zirconate titanate , *SILICON films , *SILICON nitride films , *PEROVSKITE , *MOLECULAR beam epitaxy , *TITANATES - Abstract
• Pb(ZrxTi1-x)O3 (PZT) thin films synthesized on Si by physical vapor deposition. • TiO2 used as a buffer layer on Si resulted in a crack free surface of PZT. • We have investigated the transition from rhombohedral to tetragonal PZT structure. • This research explores the potential to use PZT films on Si devices. The integration of lead zirconate titanate (Pb(Zr x Ti 1-x)O 3) (PZT) compounds on Si substrates with a smooth surface would provide a key technology for silicon photonic devices. The quality of the deposited thin film is critical in order to integrate Pb(Zr x Ti 1-x)O 3 on Si substrates for applications such as pyroelectric mid-infrared detectors or optical modulators. Here, we have applied physical vapour deposition technique using a modified molecular beam epitaxy tool to deposit perovskite Pb(Zr x Ti 1-x)O 3 on Si and Pt substrates. We have developed a method to grow crack-free PZT films on Si substrates. The fabrication procedure entailed the use of TiO 2 as a buffer layer and post annealing of the PZT/TiO 2 /Si films under oxygen atmosphere. Cross section Scanning Electron Microscopy images enabled the identification of two distinct layers: PZT and TiO 2 , which was also confirmed by Spectroscopic Ellipsometry. X-Ray Diffraction patterns indicated the transition from the rhombohedral to the tetragonal phase and the formation of the perovskite phase of Pb(Zr 0.44 Ti 0.56)O 3. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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