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ScAlN/GaN dielectric superjunction high-electron-mobility transistors (HEMTs) with high-k passivation layer Bi1.5Zn1.0Nb1.5O7 (BZN) are demonstrated for enhancement of breakdown voltage. The BZN thin film deposited by RF magnetron sputtering has a dielectric constant of 192 after postdeposition annealing at 400 °C for 10 min. The HEMT with Lg = 200 nm and Lsd = 2.0 μ m has a maximum current density of 1.98 A/mm, a maximum transconductance of 0.52 S/mm, and a threshold voltage of Vth = −3 V. With the use of SiN/BZN/SiN sandwiched passivation layer, the average value of breakdown voltage is improved from 68.9 to 121.5 V, due to the reduction of the peak electrical field between the gate and the drain. The device has a cutoff frequency (ƒT) and maximum oscillation frequency (ƒmax) of 59 and 69 GHz, respectively. Overall, the devices exhibit a significantly higher breakdown voltage with essentially the same ƒT and ƒmax values. Pulse measurements suggest that SiN/BZN/SiN has a similar passivation effect in comparison with devices passivated by a SiN-only layer. This work demonstrates that high current and high breakdown voltage can be achieved simultaneously on semiconductor heterostructures with a high sheet charge density by integration of high-k dielectrics. [ABSTRACT FROM AUTHOR]

BaSnO3, a high mobility perovskite oxide, is an attractive material for oxide-based electronic devices. However, in addition to low-field mobility, high-field transport properties such as the saturation velocity of carriers play a major role in determining the device performance. We report on the experimental measurement of the electron saturation velocity in La-doped BaSnO3 thin films for a range of doping densities. The predicted saturation velocities based on a simple LO-phonon emission mode, using an effective LO phonon energy of 120 meV show good agreement with the measurements of velocity saturation in La-doped BaSnO3 films. Density-dependent saturation velocity in the range of 1.8 × 107 cm/s reducing to 2 × 106 cm/s is predicted for δ-doped BaSnO3 channels with carrier densities ranging from 1013 cm−2 to 2 × 1014 cm−2, respectively. These results are expected to aid the informed design of BaSnO3 as an active material for high-charge density electronic transistors. [ABSTRACT FROM AUTHOR]