1. Negative Capacitance Oxide Thin-Film Transistor With Sub-60 mV/Decade Subthreshold Swing.
- Author
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Li, Yuxing, Liang, Renrong, Wang, Jiabin, Jiang, Chunsheng, Xiong, Benkuan, Liu, Houfang, Wang, Zhibo, Wang, Xuefeng, Pang, Yu, Tian, He, Yang, Yi, and Ren, Tian-Ling
- Subjects
INDIUM gallium zinc oxide ,ELECTRIC capacity ,TRANSISTORS ,THRESHOLD voltage ,INDIUM oxide ,THIN film transistors ,ZINC oxide - Abstract
In this letter, we demonstrate an integrated negative capacitance oxide thin-film transistor (NC-OTFT) based on ferroelectric Hf0.5Zr0.5O2 (HfZrO) film. The buried-gated TiN/HfZrO/Al2O3 structure is developed with indium zinc oxide as its channel. The transfer characteristics are measured with 1.2-V supply voltage. The NC-OTFT 15-nm HfZrO/6-nm Al2O3 shows $2.5\times 10^{\textsf {7}}$ ON/OFF current ratio and 120-mV anticlockwise hysteresis. The subthreshold swing (SS) values of this NC-OTFT are lower than those of the control devices without HfZrO. The reverse SS shows sub-60 mV/decade about 2 orders of drain current. The minimal reverse and forward SS values are 52.8 and 74.1 mV/decade, respectively. The NC-OTFT with 8-nm HfZrO/6-nm Al2O3 is inspected with considerably narrower hysteresis of 50 mV. Its reverse and forward SS values reach as low as 63.6 and 69.8 mV/decade, respectively. The NC effect is observed in the gate-stack capacitance of the NC-OTFTs. This NC-OTFT is promising for low operating voltage and low power consumption applications. [ABSTRACT FROM AUTHOR]
- Published
- 2019
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