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A plasmonic interference pattern can be formed when multiple surface plasmon waves overlap coherently. Utilizing a sharp edge coupling mechanism, we experimentally demonstrate plasmonic interference patterns that can be designed at will by shaping the edges in a metallic film. The patterns can also be dynamically tailored by adjusting the wavelength, the polarization, and the incident angle of the excitation light beam. Possessing the subdiffraction limited feature resolution, this dynamical manipulation method of surface plasmon patterns will have profound potentials in nanolithography, particle manipulation, and other related fields.

The commercialization of nanoscale devices requires the development of high-throughput nanofabrication technologies that allow frequent design changes. Maskless nanolithography, including electron-beam and scanning-probe lithography, offers the desired flexibility but is limited by low throughput. Here, we report a new low-cost, high-throughput approach to maskless nanolithography that uses an array of plasmonic lenses that 'flies' above the surface to be patterned, concentrating short-wavelength surface plasmons into sub-100 nm spots. However, these nanoscale spots are only formed in the near field, which makes it very difficult to scan the array above the surface at high speed. To overcome this problem we have designed a self-spacing air bearing that can fly the array just 20 nm above a disk that is spinning at speeds of between 4 and 12 m s(-1), and have experimentally demonstrated patterning with a linewidth of 80 nm. This low-cost nanofabrication scheme has the potential to achieve throughputs that are two to five orders of magnitude higher than other maskless techniques.