1. Influence of Si–N complexes on the electronic properties of GaAsN alloys.
- Author
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Jin, Y., He, Y., Cheng, H., Jock, R. M., Dannecker, T., Reason, M., Mintairov, A. M., Kurdak, C., Merz, J. L., and Goldman, R. S.
- Subjects
GALLIUM arsenide ,HETEROSTRUCTURES ,SUPERLATTICES ,ELECTRON mobility ,ANNEALING of crystals - Abstract
We have investigated the influence of Si–N complexes on the electronic properties of GaAsN alloys. The presence of Si–N complexes is suggested by a decrease in carrier concentration, n, with increasing N-composition, observed in GaAsN:Si films but not in modulation-doped heterostructures. In addition, for GaAsN:Te (GaAsN:Si), n increases substantially (minimally) with annealing-T, suggesting a competition between annealing-induced Si–N complex formation and a reduced concentration of N-related traps. Since Si–N complex formation is enhanced for GaAsN:Si growth with the (2×4) reconstruction, which has limited group V sites for As–N exchange, the (Si–N)
As interstitial pair is identified as the dominant Si–N complex. [ABSTRACT FROM AUTHOR]- Published
- 2009
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