1. Structure and chemical properties of molybdenum oxide thin films.
- Author
-
Ramana, C. V., Atuchin, V. V., Pokrovsky, L. D., Becker, U., and Julien, C. M.
- Subjects
MOLYBDENUM oxides ,OPTICAL diffraction ,ELECTRON diffraction ,ELECTRON spectroscopy ,SPECTRUM analysis - Abstract
Molybdenum oxide (MoO
3 ) exhibits interesting structural, chemical, electrical, and optical properties, which are dependent on the growth conditions and the fabrication technique. In the present work, MoO3 films were produced by pulsed-laser deposition and dc magnetron sputtering under varying conditions of growth temperature (Ts ) and oxygen pressure (pO2 ). The effect of growth conditions on the structure and chemical properties of MoO3 films was examined using x-ray diffraction, reflection high-energy electron diffraction, x-ray photoelectron spectroscopy, and infrared spectroscopic measurements. The analyses indicate that the microstructure of Mo oxide films is sensitive to Ts and pO2 . The growth conditions were optimized to produce stoichiometric and highly textured polycrystalline MoO3 films. A comparison of the microstructure of MoO3 films grown using pulsed-laser deposition and sputtering methods is also presented. [ABSTRACT FROM AUTHOR]- Published
- 2007
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