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A black silicon on emitter (BSOE) solar cell, with a uniform depletion region, was investigated by its internal quantum efficiency (IQE) and by scanning electron microscopy using an electron beam-induced current. We establish a three-dimensional energy band diagram of a non-uniform depletion region to illustrate the shunt effect by introducing a lateral electric field into the black silicon solar cell. The IQE spectral response at 450nm is enhanced by ∼31%. The conversion efficiency is improved by 0.8% abs compared with a black silicon solar cell. [Copyright &y& Elsevier]

Abstract: The black silicon has been produced by plasma immersion ion implantation (PIII) process. The microstructure and optical reflectance are characterized by field emission scanning electron microscope and spectrophotometer. Results show that the black silicon appears porous or needle-like microstructure with the average reflectance of 4.87% and 2.12%, respectively. The surface state is investigated by X-ray photoelectron spectroscopy (XPS) technique. The surface of the black silicon is composed of silicon, carbon, oxygen and fluorine element. The formation of Si x O y F z in the surface of black silicon can be proved clearly by the O 1s, F 1s and Si 2p XPS spectra. The formation mechanism of the black silicon produced by PIII process can be obtained from XPS results. The porous or needle-like structure of the black silicon will be formed under the competition of SF x + (x ≤5) and F+ ions etching effect, Si x O y F z passivation and ion bombardment. [Copyright &y& Elsevier]

Abstract: In the present study, the black silicon has been successfully produced by plasma immersion ion implantation (PIII). The microstructure and the reflectance of the black silicon have been investigated by field emission scanning electron microscope and spectrophotometer, respectively. Results show that the black silicon exhibits a needle-like structure with the average reflectance of 1.79%. The solar cell based on black silicon yields an efficiency of 15.68% with a fill factor (FF) of 0.783. [Copyright &y& Elsevier]

Abstract: In this paper, we report a simple method to produce micro/nano dual-scale textured silicon surfaces by combining alkaline etching with plasma surface processing. The surface morphologies were investigated by a field emission scanning electron microscope, while the surface reflectance and wettability were examined by a UV–VIS-NIR spectrophotometer and a drop shape analysis system, respectively. Results show that random nano-scale needle-like structures have been formed on micro-scale pyramids. The average reflectance and contact angle are 2.8% and ~120°, respectively. The solar cell based on the dual-scale textured silicon yields a high efficiency of 17.5% with a short circuit current density of 36.0mA/cm2. [Copyright &y& Elsevier]