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1. Guidelines for Etching Silicon MEMS Structures Using Fluorine High-Density Plasmas at Cryogenic Temperatures.

Author

de Boer, Meint J., Gardeniers, J.G.E., Jansen, Henri V., Smulders, Edwin, Gilde, Melis-Jan, Roelofs, Gerard, Sasserath, Jay N., and Elwenspoek, Miko

Subjects
MICROELECTROMECHANICAL systems, SILICON, FLUORINE, PLASMA gases, LOW temperature engineering
Abstract

Presents guidelines for etching silicon microelectromechanical systems structures using fluorine high-density plasmas at cryogenic temperatures. Deposition of the silicon layer; Kinetic energy of ions in the plasma; Selectivity of silicon etching; Crystallographic preference etching of silicon.

Published
2002
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