1. H adsorption at Ag/Si interfaces in epitaxially grown Ag(111) films on Si(111)7x7 Substrates
- Author
-
aoki, yuki, SHI, Lin, unknown, unknown, Tadashi, Sugimoto, and HIRAYAMA, HIROYUKI
- Subjects
Materials science ,Silicon ,Thermal desorption spectroscopy ,Thermal desorption ,Analytical chemistry ,chemistry.chemical_element ,Surfaces and Interfaces ,Condensed Matter Physics ,Epitaxy ,Surfaces, Coatings and Films ,law.invention ,Crystallography ,Adsorption ,Transition metal ,chemistry ,law ,Materials Chemistry ,Scanning tunneling microscope ,Spectroscopy - Abstract
The interaction of atomic H with Ag(1 1 1)/Si(1 1 1)7 × 7 surfaces was studied by thermal desorption (TD) spectroscopy and scanning tunneling microscopy (STM) at room temperature. TD spectroscopy revealed an intense peak from mono H–Si bonds, even though the Si surface was covered by the Ag atoms. This peak was not observed from Ag-coated SiO2/Si substrates. STM observation showed no clear change of the Ag surface morphology resulting from H exposure. All these results indicate that the atomic H adsorbs at neither the Ag surfaces nor Ag bulk sites, but at the Ag/Si interface by diffusing through the Ag film.
- Published
- 2010