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1. Silicide formation by high-temperature reaction of Rh with model SiO[sub 2] films.

Author

Labich, S. and Kohl, A.

Subjects
*RHODIUM, *SILICA, *CHEMICAL vapor deposition, *REACTIVITY (Chemistry)
Abstract

Investigates the metal-support interaction between rhodium and silica for a rhodium/silicon dioxide/molybdenum model system. Use of chemical vapor deposition in preparing thin silicon oxide layers; Effect of heating in ultrahigh vacuum on the cluster size and binding energies of surface species.

Published
1998
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