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Both CuI and CuI:Zn semiconductor thin films, along with MSM-structured UV photodetectors, were prepared on flexible mica substrates at low temperature (150 °C) by a wet chemical method. The two CuI-based films exhibited a polycrystalline phase with an optical bandgap energy close to 3.0 eV. Hall effect measurements indicated that the CuI thin film sample had p-type conductivity, while the CuI:Zn thin film sample exhibited n-type conductivity, with the latter showing a higher carrier mobility of 14.78 cm2/Vs compared to 7.67 cm2/Vs for the former. The I-V curves of both types of photodetectors showed asymmetric rectification characteristics with rectification ratios at ±3 V of 5.23 and 14.3 for the CuI and CuI:Zn devices, respectively. Flexible CuI:Zn devices exhibited significantly better sensitivity, responsivity, and specific detectivity than CuI devices both before and after static bending tests. It was found that, while the optoelectronic performance of flexible CuI-based photodetectors degraded under tensile stress during static bending tests, they still exhibited good reproducibility and repeatability in their photoresponses. [ABSTRACT FROM AUTHOR]

The Ga-doped Mg0.2Zn0.8O (GMZO) transparent semiconductor thin films were prepared using the sol-gel and spin-coating deposition technique. Changes in the microstructural features, optical parameters, and electrical characteristics of sol-gel-synthesized Mg0.2Zn0.8O (MZO) thin films affected by the amount of Ga dopants (0–5 at%) were studied. The results of grazing incidence X-ray diffraction (GIXRD) examination showed that all as-prepared MZO-based thin films had a wurtzite-type structure and hexagonal phase, and the incorporation of Ga ions into the MZO nanocrystals refined the microstructure and reduced the average crystallite size and flatness of surface roughness. Each glass/oxide thin film sample exhibited a higher average transmittance than 91.5% and a lower average reflectance than 9.1% in the visible range spectrum. Experimental results revealed that the optical bandgap energy of the GMZO thin films was slightly higher than that of the MZO thin film; the Urbach energy became wider with increasing Ga doping level. It was found that the 2 at% and 3 at% Ga-doped MZO thin films had better electrical properties than the undoped and 5 at% Ga-doped MZO thin films. [ABSTRACT FROM AUTHOR]

Pure CuI and Zn-substituted CuI (CuI:Zn) semiconductor thin films, and metal-semiconductor-metal (MSM) photodetectors were fabricated on glass substrates by a low-temperature solution process. The influence of Zn substitution concentration (0–12 at%) on the microstructural, optical, and electrical characteristics of CuI thin films and its role in improving the optoelectronic performance of CuI MSM photodetectors were investigated in this study. Incorporation of Zn cation dopant into CuI thin films improved the crystallinity and increased the average crystalline size. XPS analysis revealed that the oxidation state of Cu ions in all the CuI-based thin films was +1, and the estimated values of [Cu]/[I] for the CuI:Zn thin films were lower than 0.9. It was found that the native p-type conductivity of polycrystalline CuI thin film was converted to n-type conductivity after the incorporation of Zn ions into CuI nanocrystals, and the electrical resistivity decreased with increases in Zn concentration. A time-resolved photocurrent study indicated that the improvements in the optoelectronic performance of CuI MSM photodetectors were obtained through the substitution of Zn ions, which provided operational stability to the two-terminal optoelectronic device. The 8 at% Zn-substituted CuI photodetectors exhibited the highest response current, responsivity, and EQE, as well as moderate specific detectivity. [ABSTRACT FROM AUTHOR]

Transparent Ga and In co-doped ZnO (ZnO:Ga-In) semiconductor thin films were deposited on Corning glass substrates by the sol-gel spin-coating process. The ZnO:Ga-In thin films were used as the sensing layer of metal–semiconductor–metal (MSM)-type ultraviolet (UV) photodetectors (PDs). In this study, the optoelectronic characteristics of ZnO:Ga-In MSM PDs with symmetrical interdigital electrodes (Al–Al) and asymmetrical interdigital electrodes (Al–Au) were compared. The as-prepared ZnO:Ga-In thin films were polycrystalline, and they had a single-phase hexagonal wurtzite structure and high transparency (~88.4%) in the visible region. The MSM-PDs with asymmetric electrodes had significantly reduced dark current (9.6 × 10−5 A at 5 V) according to the current-voltage (I-V) characteristics and higher photoresponse properties than those of the MSM-PDs with symmetric electrodes, according to the current-time (I-t) characteristics. In addition, the Al–Au devices were self-powered without an applied bias voltage. The photocurrent was 6.0 × 10−5 A; the sensitivity and responsivity were 0.25 and 0.03 mA/W, respectively, under UV illumination. [ABSTRACT FROM AUTHOR]

• Transparent Ga 2 O 3 semiconductor thin films were deposited by magnetron sputtering. • Results indicated the 1% oxygen flow ratio film had device quality characteristics. • Device with Ni-Ni symmetrical electrodes had good photoresponse characteristics. • Self-powered device realized by using paired Ni-Al asymmetric metal contacts. Gallium oxide (Ga 2 O 3) thin films were deposited on quartz substrates under different oxygen flow ratios (O 2 /[O 2 +Ar], 0%−5%) by radio-frequency (RF) magnetron sputtering technique followed by thermal annealing at 900 °C for 2 h under N 2 atmosphere. The influence of the oxygen concentration on the structural and optical characteristics of Ga 2 O 3 thin films was investigated. The Ga 2 O 3 thin films prepared under an oxygen flow ratio of 1% exhibited optimum crystal quality and the lowest oxygen vacancy (V O) concentration according to X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and photoluminescence (PL) investigations. All as-prepared polycrystalline Ga 2 O 3 thin film samples exhibited high average transmittance above 87.8% in the visible spectral region and the 0% and 1% thin films had optical bandgap energies of about 4.9 eV. We also fabricated metal−semiconductor−metal (MSM) photodetectors based on 1% Ga 2 O 3 thin films by employing pairs of Ni−Ni symmetrical or Ni−Al asymmetrical interdigitated electrodes. The Ni−Ni photodetector had a high on/off current ratio (I on /I off > 105), a responsivity of 88.7 mA/W, and specific detectivity of 4.81×1010 J at 10 V bias under ultraviolet light-C (UVC) illumination, and the Ni−Al photodetector exhibited self-driven behavior along with short rise and fall times (0.45 s and 0.69 s, respectively). [ABSTRACT FROM AUTHOR]

Solution-processed p-type gallium tin oxide (GTO) transparent semiconductor thin films were prepared at a low temperature of 300 °C using ultraviolet (UV)-assisted annealing instead of conventional high-temperature annealing (> 500 °C). We report the effects of UV irradiation time on the structural, optical, and electrical properties of sol-gel derived GTO thin films and a comparison study of the physical properties of UV-assisted annealed (UVA) and conventional thermally annealed (CTA) GTO thin films. The Ga doping content was fixed at 15 at% in the precursor solution ([Ga]/[Sn]+[Ga] = 15%). After a spin-coating and preheating procedure was performed two times, the dried sol-gel films were heated on a hotplate at 300 °C under UV light irradiation for 1–4 h. Each UVA GTO thin film had a dense microstructure and flat free surface and exhibited an average optical transmittance approaching 85.0%. The level of crystallinity, crystallite size, and hole concentration density of the GTO thin films increased with increasing UV irradiation time. In this study, the UVA 4 h thin film samples exhibited the highest hole concentration (9.87 × 10 17 cm −3 ) and the lowest resistivity (1.8 Ω cm) and had a hole mobility of 5.1 cm 2 /Vs. [ABSTRACT FROM AUTHOR]

Ultraviolet (UV) irradiation-assisted thermal annealing is used for the fabrication of Mg doped InZnO (MIZO) semiconductor thin films and metal-semiconductor-metal (MSM) type photodetectors on alkali-free glasses at a low temperature of 300 °C. In this study, the effects of UV irradiation time on the structural features and the optical and electrical properties of sol-gel derived MIZO thin films were investigated, and the photoresponse properties of MIZO photodetectors fabricated using UV-assisted thermal annealing (UV-TA) and conventional thermal annealing (CTA) were compared. The molar ratio of In:Zn was fixed at 3:2, and the Mg content was maintained at 20 at% ([Mg]/[In+Zn]) in the precursor solution. After a spin-coating and drying procedure was performed twice, the dried sol-gel films were heated on a hotplate at 300 °C and exposed to UV irradiation in ambient air. The UV irradiation time was adjusted to 1, 2, 3, and 4 h. All annealed MIZO thin films had a dense microstructure, uniform film thickness, and flat surface and exhibited good optical transmittance (> 86.0%). The mean resistivity decreased with increasing irradiation time, and the samples irradiated for 4 h exhibited the lowest mean resistivity of 4.4×10 2 Ω-cm. Current-voltage (I-V) characteristics showed that the MIZO photodetectors operated in the photoconductive mode. Under illumination with UVC light, the MIZO photodetectors exhibited an I light -to-I dark ratio of 7.7 × 10 2 and had a photoresponsivity of 5.0 A/W at a bias of 5 V. [ABSTRACT FROM AUTHOR]

Undoped, Mg-doped, and Zn-doped p-type CuGaO 2 semiconductor thin films were deposited on quartz substrates by a sol-gel spin coating method. The effects of the two dopants (Mg and Zn) on the structural features and electrical properties of the CuGaO 2 -based thin films were investigated. The doping concentration was maintained at 1 at% in the impurity doping precursor solutions. X-ray diffraction (XRD) results showed that only the undoped CuGaO 2 thin films had a single delafossite phase; Mg- and Zn-doped thin films exhibited mixed CuGaO 2 and CuGa 2 O 4 phases. Scanning probe microscopy (SPM) images showed that the surfaces of the dense CuGaO 2 -based thin films exhibited obviously granular structures. Hall measurements confirmed that the three oxide semiconductor thin films had p-type conductivity. Compared with undoped CuGaO 2 thin films, the Mg- and Zn-doped thin films exhibited improvements in electrical properties, and the Zn-doped thin films had the highest mean carrier concentration of 3.49×10 16 cm −3 . In addition, three kinds of n-Si/p-CuGaO 2 -based thin film heterojunctions were fabricated and their current-voltage (I-V) characteristics were examinated. It was found that the n-Si/p-CuGaO 2 :Zn heterojunction exhibited a distinct rectifying I-V characteristic with a forward turn-on voltage of 2.9 V. [ABSTRACT FROM AUTHOR]

The n-type zinc-tin oxide (ZTO) and p-type nickel oxide (NiO) semiconductor thin films were prepared by the sol-gel spin coating process. The influence of 4 at% Mg and Cu doping on the microstructural, optical, and electrical characteristics of NiO thin films and physical properties of ZTO thin film were investigated. In addition, bi-layered ZTO/NiO thin films were grown onto Corning glasses to develop a visible light transparent p-n heterojunction ultraviolet (UV) photodetector. Mg doping slightly enhances the visible transparency and enlarges the optical bandgap energy, while Cu doping decreases the visible transparency and narrows the optical bandgap energy. The electrical properties of NiO sol-gel thin films were improved through Mg and Cu doping. According to the current-voltage (I–V) characteristic curves, the n-ZTO/p-NiO:Mg photodetector had the highest rectification ratio of 11.7 and on-to-off current ratio of 18.3 at 5 V bias. Under UV illumination, the three kinds of devices all exhibited a self-powered nature, while the Mg- and Cu-doped NiO devices had better photoresponse characteristics than the undoped NiO device. It was found that the Mg-doped NiO devices displayed the best photoconductivity gain and sensitivity, and acceptable response speed and responsivity, with applied reverse bias of 1 V. [Display omitted] • n-ZTO and p-NiO semiconductor films were prepared via sol-gel spin-coating process. • Results of XRD, SEM, XPS confirmed the incorporation of Mg and Cu into NiO films. • Fabrication of p-n heterojunctions for developing oxide based UV photodetectors. • The n-ZTO/p-NiO based heterojunction was adopted in self-powered UV photodetectors. • NiO:Mg device exhibited the best photosensing characteristics than those of others. [ABSTRACT FROM AUTHOR]

Solar-blind ultraviolet (UV) photodetectors with an amorphous zinc−tin oxide (a-ZTO) sensing layer have been fabricated on alkali-free glass substrates by a sol-gel method and spin coating technique. The as-prepared a-ZTO semiconductor thin films are highly transparent (>88.5%) in the visible region and exhibit moderate electrical properties at room temperature. The effects of changes in the asymmetry ratio of the line-width of a pair of Al interdigitated electrodes on the photoelectrical characteristics of solution-processed a-ZTO metal−semiconductor−metal (MSM) UV photodetectors was investigated. These photodetector devices had good photosensing properties, and their current-voltage (I–V) characteristic exhibited obvious rectification behavior under UV light illumination when operated at bias voltages of -3 V–3 V. Experimental results showed that the responsivity and specific detectivity of the a-ZTO MSM photodetectors increased with increases in the asymmetry ratio of a pair of Al interdigital electrodes. The a-ZTO MSM UV photodetector operated at 3 V bias voltage had the best responsivity of 7.42 mA/W and the highest specific detectivity of 6.35 × 107 J when the asymmetry ratio of electrodes was 10:1. • The a-ZTO films are highly transparent and exhibit moderate electrical properties. • Increasing asymmetry ratio of electrodes reduce resistance of detectors in dark. • I–V curves of devices exhibit obvious rectification behavior under UV illumination. • Performance of a-ZTO photodetectors were enhanced by increasing asymmetry ratio. • Low bias-voltage driving a-ZTO photodetectors fabricated by sol-gel spin-coating. [ABSTRACT FROM AUTHOR]

Abstract: We have employed KrF excimer laser annealing (ELA) treatment on sol–gel derived indium–zinc oxide (IZO) precursor films to develop a method of low thermal-budget processing. As-coated IZO sol–gel film was dried at 150°C and then annealed using KrF excimer laser irradiation under ambient air. The laser irradiation energy density was adjusted to 150, 250, 350, and 450mJ/cm2 to investigate the effects of laser irradiation energy density on the microstructure, surface morphology, optical transmittance, and electrical properties of laser annealed IZO thin films. Results of GIXRD and TEM-SAED indicated that the ELA IZO thin films had an amorphous phase structure. The surface characteristics and electrical properties of laser annealed IZO thin films were significantly affected by the laser irradiation energy density. It was found that the dried IZO sol–gel films irradiated with a laser energy density of 350mJ/cm2 exhibited the flattest surface, the highest average optical transmittance in the visible region, and the best electrical properties among all ELA samples. [Copyright &y& Elsevier]

Highlights: [•] Transparent GZO, GZO:B, GZO:Al semiconductor films were prepared by sol–gel method. [•] The GZO:Al films had the lowest resistivity and the highest Hall mobility. [•] All ZnO-based UV photodetectors operated in the photoconductive mode. [•] The GZO:Al detector had the highest responsivity of 3.22A/W at a bias of 5V. [ABSTRACT FROM AUTHOR]

Amorphous indium gallium zinc oxide (a-IGZO) semiconductor thin films and transistors were deposited on alkali-free glasses by the sol–gel route. The atomic ratio of In:Ga:Zn in the solution was 0.7:0.3:1. In this study, the effects of annealing temperature on the structural, surface condition, optical transmittance, and electrical resistivity of a-IGZO semiconductor thin films were investigated. GIXRD measurements and TEM-NBD analysis indicated that all annealed IGZO thin films had an amorphous phase structure. The dried IGZO sol–gel films annealed at a temperature higher than 425°C had a flat surface and exhibited high transparency (>89%) in the visible region. According to results from TGA, FT-IR and XPS, the residual organic compounds in the dried IGZO sol–gel films were completely removed at the annealing temperatures higher than 450°C. Therefore, we chose the 450°C annealed thin film as the active channel layer in the bottom-gate, bottom-contact (BGBC) thin-film transistor (TFT) in the present study. Current–voltage (I–V) characteristics of the 450°C annealed a-IGZO TFT revealed that it operated in n-type behavior with a positive threshold voltage (enhancement mode). [ABSTRACT FROM AUTHOR]

Undoped, Al-doped and Al-B co-doped ZnO transparent semiconductor thin films were deposited on glass substrates by sol-gel method and spin coating technique. This study investigated the influence of Al (2 at.%) doping and Al (2 at.%)-B (1 or 2 at.%) co-doping on the microstructural, surface morphological, electrical and optical properties of the ZnO-based thin films. XRD analysis indicated that all as-prepared ZnO-based thin films were polycrystalline with a single-phase hexagonal wurtzite structure. The substitution of extrinsic dopants (Al or Al-B) into ZnO thin films can significantly degrade the crystallinity, refine the microstructures, improve surface flatness, enhance the optical transparency in the visible spectrum and lead to a shift in the absorption edge toward the short-wavelength direction. Experimental results showed that the Al-doped and Al-B co-doped ZnO thin films exhibited high average transmittance (>91.3%) and low average reflectance (<10%) in the visible region compared with the ZnO thin film. The optical parameters, including the optical bandgap, Urbach energy, extinction coefficient and refractive index, changed with the extrinsic doping level. Measured results of electrical properties revealed that the singly doped and co-doped samples exhibited higher electron concentrations and lower resistivities than those of the undoped sample and suggested that 2 at.% Al and 1 at.% B were the optimum dopant concentrations for achieving the best electrical properties in this study. [ABSTRACT FROM AUTHOR]

P-type ZnO transparent semiconductor thin films were prepared on glass substrates by the sol-gel spin-coating process with N doping and Ga–N co-doping. Comparative studies of the microstructural features, optical properties, and electrical characteristics of ZnO, N-doped ZnO (ZnO:N), and Ga–N co-doped ZnO (ZnO:Ga–N) thin films are reported in this paper. Each as-coated sol-gel film was preheated at 300 °C for 10 min in air and then annealed at 500 °C for 1 h in oxygen ambient. X-ray diffraction (XRD) examination confirmed that these ZnO-based thin films had a polycrystalline nature and an entirely wurtzite structure. The incorporation of N and Ga–N into ZnO thin films obviously refined the microstructures, reduced surface roughness, and enhanced the transparency in the visible range. X-ray photoelectron spectroscopy (XPS) analysis confirmed the incorporation of N and Ga–N into the ZnO:N and ZnO:Ga–N thin films, respectively. The room temperature PL spectra exhibited a prominent peak and a broad band, which corresponded to the near-band edge emission and deep-level emission. Hall measurement revealed that the ZnO semiconductor thin films were converted from n-type to p-type after incorporation of N into ZnO nanocrystals, and they had a mean hole concentration of 1.83 × 1015 cm−3 and a mean resistivity of 385.4 Ω·cm. In addition, the Ga–N co-doped ZnO thin film showed good p-type conductivity with a hole concentration approaching 4.0 × 1017 cm−3 and a low resistivity of 5.09 Ω·cm. The Ga–N co-doped thin films showed relatively stable p-type conduction (>three weeks) compared with the N-doped thin films. [ABSTRACT FROM AUTHOR]

The effects of Mg on the microstructural, optical, and electrical properties of sol-gel derived ZnO transparent semiconductor thin films and the photoelectrical properties of photodetectors based on MgxZn1−xO (where x = 0 to 0.3) thin films with the metal-semiconductor-metal (MSM) configuration were investigated in this study. All the as-synthesized ZnO-based thin films had a single-phase wurtzite structure and showed high average transmittance of 91% in the visible wavelength region. The optical bandgap of MgxZn1−xO thin films increased from 3.25 to 3.56 eV and the electrical resistivity of the films rose from 6.1 × 102 to 1.4 × 104 Ω·cm with an increase in Mg content from x = 0 to x = 0.3. Compared with those of the pure ZnO thin film, the PL emission peaks of the MgZnO thin films showed an apparent blue-shift feature in the UV and visible regions. The photo-detection capability was investigated under visible, UVA, and UVC light illumination. Linear I-V characteristics were obtained in these ZnO-based photodetectors under dark and light illumination conditions, indicating an ohmic contact between the Au electrodes and ZnO-based thin films. It was found that the pure ZnO photodetector exhibited the best photoconductivity gain, percentage of sensitivity, and responsivity under UVA illumination. Under UVC illumination, the photoconductivity gain and percentage of sensitivity of the MgZnO photodetectors were better than those of the pure ZnO photodetector. [ABSTRACT FROM AUTHOR]