1. Molecular layer deposition for the fabrication of desalination membranes with tunable metrics.
- Author
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Welch, Brian C., McIntee, Olivia M., Myers, Tyler J., Greenberg, Alan R., Bright, Victor M., and George, Steven M.
- Subjects
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ARAMID fibers , *THIN films , *ATOMIC force microscopy , *REVERSE osmosis , *ROOT-mean-squares - Abstract
The recent advancement of semiconductor devices to the near-atomic scale necessitated the development of atomic layer processing methods, including molecular layer deposition (MLD). This gas-phase deposition technique creates semipermeable polymer films with precise control of composition and thickness. Herein, MLD was used to produce thin-film composite reverse osmosis membranes. Aromatic polyamide films as thin as 0.5 nm were applied to NF270 nanofiltration membranes using m -phenylenediamine and trimesoyl chloride. Within two molecular layers, desalination performance was affected. As film thickness increased to 15 nm (48 MLD cycles), performance progressed from nanofiltration to reverse osmosis metrics in terms of salt rejection and water permeance. With film thickness > 5 nm, rejection values exceeded a small sampling of commercial membranes. In all cases, a tradeoff between rejection and permeance was observed. Atomic force microscopy measurements indicate that MLD enhancement led to removal of small-scale roughness features and resulted in a root mean square roughness difference of <0.1 nm from the substrate. These initial MLD studies represent a novel processing approach that offers a potential pathway for the fabrication of membranes with finely tailored properties. [Display omitted] • MLD added an ultrathin MPD-TMC polyamide active layer to commercial NF membranes. • Progressive MLD systematically altered flux/rejection metrics from NF to RO values. • Controlled increase of MLD layer thickness increased rejection but decreased flux. • Atomic force microscopy revealed that MLD removed small-scale roughness features. [ABSTRACT FROM AUTHOR]
- Published
- 2021
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