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Al-rich AlGaN-based deep-ultraviolet light-emitting diodes (DUV LEDs) have a low light extraction efficiency, especially when the emission wavelength is shorter than 280 nm, and this is partially because of the dominant transverse-magnetic polarized light. Our results show that the transverse-electric (TE) polarized light can be obtained even if the emission wavelength becomes even shorter by reducing the quantum well thickness. The ultrathin quantum well enables the enhanced TE-polarized emission that arises from the redistributed subbands for holes. On the contrary to the common belief, we observe a blueshift for the emission wavelength when the AlN composition in the quantum barrier increases. The internal quantum efficiency (IQE) for DUV LEDs with ultrathin quantum wells is no longer determined by the quantum-confined Stark effect, while quantum barrier with high AlN composition is vitally important to improve the electron injection efficiency and thus enhance the IQE. [ABSTRACT FROM AUTHOR]

GaN-based micro-size light-emitting diode (μLED) have emerged as a promising light sources for a wide range of applications in displays, visible light communication etc. In parallel with the two key technological bottlenecks: full-color scheme and mass transfer technique that need overcoming, it is known that the low external quantum efficiency (EQE) is also another challenge for μLEDs from the perspective of manufacturing technology and device physics. The low EQE for GaN based μLEDs is opposite to the common belief for GaN-based LEDs, such that GaN based LEDs are featured with high quantum efficiency, mechanically robust and energy saving. Therefore, in this work, we have reviewed the origin for the low EQE for μLEDs. More importantly, we have also reported the underlying devices physics and proposed optimization strategies to boost the EQE for μLEDs. Our work is targeted to provide a guideline for the community to develop high-performance GaN-based μLEDs. [ABSTRACT FROM AUTHOR]

Owing to high surface-to-volume ratio, InGaN-based micro-light-emitting diodes (μLEDs) strongly suffer from surface recombination that is induced by sidewall defects. Moreover, as the chip size decreases, the current spreading will be correspondingly enhanced, which therefore further limits the carrier injection and the external quantum efficiency (EQE). In this work, we suggest reducing the nonradiative recombination rate at sidewall defects by managing the current spreading effect. For that purpose, we properly reduce the vertical resistivity by decreasing the quantum barrier thickness so that the current is less horizontally spreaded to sidewall defects. As a result, much fewer carriers are consumed in the way of surface nonradiative recombination. Our calculated results demonstrate that the suppressed surface nonradiative recombination can better favor the hole injection efficiency. We also fabricate the μLEDs that are grown on Si substrates, and the measured results are consistent with the numerical calculations, such that the EQE for the proposed μLEDs with properly thin quantum barriers can be enhanced, thanks to the less current spreading effect and the decreased surface nonradiative recombination. [ABSTRACT FROM AUTHOR]

In this work, we simply take advantage of the polarization effect to efficiently improve the hole injection from the p-type electron blocking layer (p-EBL) to the end of the active region for AlGaN based deep ultraviolet light emitting diodes (DUV LEDs). By properly increasing the AlN composition of AlGaN quantum barriers, a smaller positive polarized charge density at the last quantum barrier/p-EBL interface can be obtained, which correspondingly leads to the suppressed hole depletion and the reduced hole blocking effect in the p-EBL. Meanwhile, we properly increase the quantum well thickness so that the polarized electric field can even more accelerate the holes, and this will homogenize the hole distribution more across the MQWs. Therefore, the external quantum efficiency for DUV LEDs can be enhanced. [ABSTRACT FROM AUTHOR]

Due to the low hole mobility and the unsatisfying p-type doping efficiency, the p-type layer has a low effective hole concentration and a large electrical resistivity that result in poor hole injection efficiency and significant current crowding effect for III-nitride light-emitting diodes (LEDs). In this work, we report a III-nitride LED architecture comprising a dielectric-constant-controlled tunnel junction to improve both the current spreading effect and the hole injection efficiency. The dielectric-constant-controlled tunnel junction is an n+-GaN/AlGaN/p+-GaN heterojunction, in which the dielectric constant for the AlGaN layer is smaller than that for the GaN layer, and therefore, compared to the conventional n+-GaN/p+-GaN homojunction, the electric field within the tunnel junction is increased and hence, the hole injection can be substantially enhanced if the n+-GaN/AlGaN/p+-GaN heterojunction is properly designed. Furthermore, the proposed device can better spread the current compared to the LED without a tunnel junction. As a result, the internal quantum efficiency has been improved for the LED possessing the dielectric-constant-controlled tunnel junction. [ABSTRACT FROM AUTHOR]

In this report, we locally modulate the doping type in the n-AlGaN layer by proposing n-AlGaN/p-AlGaN/n-AlGaN (NPN-AlGaN)-structured current spreading layer for AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs). After inserting a thin p-AlGaN layer into the n-AlGaN electron supplier layer, a conduction band barrier can be generated in the n-type electron supplier layer, which enables the modulation of the lateral current distribution in the p-type hole supplier layer for DUV LEDs. Additionally, according to our studies, the Mg doping concentration, the thickness, the AlN composition for the p-AlGaN insertion layer and the NPN-AlGaN junction number are found to have a great influence on the current spreading effect. A properly designed NPN-AlGaN current spreading layer can improve the optical output power, external quantum efficiency (EQE), and the wall-plug efficiency (WPE) for DUV LEDs. [ABSTRACT FROM AUTHOR]

AlGaN‐based deep ultraviolet light‐emitting diodes (DUV LEDs) are featured with small size, DC driving, no environmental contamination etc., and they are now emerging as the excellent solid‐state light source to replace the conventional mercury based light tubes. Nevertheless, the DUV LEDs are currently affected by the poor external quantum efficiency (EQE), which is caused by the low internal quantum efficiency (IQE) and the very unsatisfying light extraction efficiency (LEE). In this work, the authors disclose the underlying mechanism for the low EQE and summarize the technologies that have been adopted so far for enhancing the EQE. This paper comprehensively reviews III–V nitride based deep ultraviolet light‐emitting diodes (DUV LEDs), which are suffering from the low external quantum efficiency (EQE). This article conducts an in‐depth investigation on the issues that DUV LEDs are encountering now. The strategies that are taken by the research community to improve the EQE are summarized and analyzed. [ABSTRACT FROM AUTHOR]

In this report, AlGaN-based deep ultraviolet light-emitting diodes (DUV LEDs) with different p-AlGaN/n-AlGaN/p-AlGaN (PNP-AlGaN) structured current spreading layers have been described and investigated. According to our results, the adopted PNP-AlGaN structure can induce an energy barrier in the hole injection layer that can modulate the lateral current distribution. We also find that the current spreading effect can be strongly affected by the thickness, the doping concentration, the PNP loop, and the AlN composition for the inserted n-AlGaN layer. Therefore, if the PNP-AlGaN structure is properly designed, the forward voltage, the external quantum efficiency, the optical power, and the wall-plug efficiency for the proposed DUV LEDs can be significantly improved as compared with the conventional DUV LED without the PNP-AlGaN structure. [ABSTRACT FROM AUTHOR]

This work reports a nearly efficiency-droop-free AlGaN-based deep ultraviolet light-emitting diode (DUV LED) emitting in the peak wavelength of 270 nm. The DUV LED utilizes a specifically designed superlattice p-type electron blocking layer (p-EBL). The superlattice p-EBL enables a high hole concentration in the p-EBL which correspondingly increases the hole injection efficiency into the multiple quantum wells (MQWs). The enhanced hole concentration within the MQW region can more efficiently recombine with electrons in the way of favoring the radiative recombination, leading to a reduced electron leakage current level. As a result, the external quantum efficiency for the proposed DUV LED structure is increased by 100% and the nearly efficiency-droop-free DUV LED structure is obtained experimentally. [ABSTRACT FROM AUTHOR]