1. Local sputter etching by micro plasma jet in SEM
- Author
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Matra, Khanit, Mizobuchi, Yusuke, Furuta, Hiroshi, and Hatta, Akimitsu
- Subjects
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SPUTTERING (Physics) , *PLASMA gases , *SCANNING electron microscopes , *GAS flow , *PRESSURE , *DIRECT currents - Abstract
Abstract: A local high pressure micro plasma jet was proposed for micro scale local sputter etching in a vacuum system. A small orifice gas nozzle as an anode was placed in a Scanning Electron Microscope (SEM) chamber to produce the local high gas pressure and supply Argon gas for DC plasma generation at a short gap distance. The characteristics of local sputter etching by the micro plasma jet were studied. At DC power of 1.68 mW, a silicon sputtering rate of approximately 0.01 μm/s was achieved by using an orifice 40 μm in diameter at 2.5 sccm gas flow rate and 100 μm gap distance. The sputtered area was 60 μm in diameter. [Copyright &y& Elsevier]
- Published
- 2013
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