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The ferroelectric thin films have a single-crystal structure. Surface structure had a big influence on the microstructure of thin films.

Research describing the characteristics of epitaxial strontium ruthenate thin films is presented. Observations by atomic force and transmission electron microscopy are analysed.

The microstructure of nitride layers of AISI 316 stainless steel produced by intense plasma assisted processing is examined.

Ti atomic bonding environment in Ti-containing hydrocarbon coatings was examined using x-ray absorption near edge structure spectroscopy.

Research was conducted to examine the influence of lattice stress relaxation on the microstructures of epitaxial thin films through domain structure investigations of epitaxial SrRuO3 thin films developed on vicinal (001) SrTiO3 substrates using transmission electron microscopy and x-ray diffraction. Results indicate that the lattice strain relaxation has a crucial effect on the microstructures and characteristics of epitaxial thin films when the substrate material is taken.

A series of TiN/Ti multilayer coatings with TiN layer thickness and different Ti layer thicknesses are deposited by using a large area filtered arc deposition method. The studies have shown that the reduction in the defect density in both TiN and Ti layers and the relaxation of the stain by the diffusion of the Ti atoms in the underneath Ti layer has contributed to the decrease in the total internal stress with increasing Ti layer thickness.

The microstructural evolution of Co-DLC nanocomposite films as a function of Ar/CH4 flow ratio in the discharge and chamber pressure is investigated. Present evidence indicates that the Co nanorod formation is under kinetic control.

A close match is obtained to the positive temperature coefficient of resistance of platinum from a pyrochlore paste. Thick film resistor is of interest for circuits as an alternative to thin film platinum temperature sensor elements as they can withstand a near-engine environment.