1. Robust design of broadband EUV multilayer using multi-objective evolutionary algorithm
- Author
-
Haigui Yang, Xue-peng Gong, and Shang-qi Kuang
- Subjects
business.industry ,Computer science ,Extreme ultraviolet lithography ,Computer Science::Neural and Evolutionary Computation ,Evolutionary algorithm ,Physics::Optics ,02 engineering and technology ,021001 nanoscience & nanotechnology ,01 natural sciences ,Atomic and Molecular Physics, and Optics ,Electronic, Optical and Magnetic Materials ,010309 optics ,Set (abstract data type) ,Quality (physics) ,Optics ,Aperiodic graph ,Extreme ultraviolet ,0103 physical sciences ,Broadband ,Electrical and Electronic Engineering ,Physical and Theoretical Chemistry ,Thin film ,0210 nano-technology ,business - Abstract
Considering the random fluctuations of the layer thickness, a method of robust design of broadband EUV multilayers based on multi-objective evolutionary algorithm is presented. Owing to the optimization of multi-objective evolutionary algorithm, the optical performance and robust quality of broadband Mo/Si multilayer can be optimized simultaneously, and then a set of robust designs of aperiodic EUV multilayers, which are insensitive to the thickness errors can be obtained in one single simulation run. The robust designs of broadband Mo/Si multilayers could be used to reduce the production risks of EUV mirrors, and this research demonstrates a great potential of application of multi-objective evolutionary algorithm on the design of optical thin film.
- Published
- 2018
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