1. Influence of boron implantation induced defects on solar cells: Modeling the process defects.
- Author
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Masilamani, Sangaravadivel, Ammapet Vijayan, Ramachandran, and Varadharajaperumal, Muthubalan
- Subjects
SOLAR cells ,DISLOCATION loops ,BORON ,SILICON wafers ,PHOTOVOLTAIC power systems ,DIODES - Abstract
The effect of process-induced defects on the photo-generated charge-carrier lifetime and solar cell performance is critical, which will help optimize the process recipe. In this work, we attempt to quantify the effects of process-induced defects during boron implantation on the n-type silicon wafer in different annealing ambiences. We have evaluated the role of defects that can be formed during oxygen and inert ambience annealing on n-type bifacial passivated emitter rear totally diffused solar cells using a recombination current prefactor (J
0 ). The numerically calculated J0 is calibrated with the reported experimental J0 values using two different methods: (i) Shockley–Read–Hall lifetime and (ii) effective trap-density method. In the latter method, we used the simulated defect density profiles. Both methods capture the process-induced degradation. We observed that the process-induced defects could deteriorate by almost 1% absolute efficiency for the considered annealing conditions. We found that dislocation loops alone cause an ignorable effect on terminal characteristics, but other process-induced mechanisms could dominantly degrade the cell's performance. To further support, we show that independent defects (apart from coupled defects) other than dislocation loops could explain the experimentally reported boron-implanted diodes' J–V curves under reverse bias conditions. [ABSTRACT FROM AUTHOR]- Published
- 2023
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