1. Determination of the Complex Refractive Index of GaSb1−xBix by Variable‐Angle Spectroscopic Ellipsometry.
- Author
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McElearney, John, Grossklaus, Kevin, Menasuta, T. Pan, and Vandervelde, Thomas
- Subjects
- *
MOLECULAR beam epitaxy , *MOLECULAR beams , *VALENCE bands , *THRESHOLD energy , *OPTOELECTRONICS - Abstract
Variable‐angle spectroscopic ellipsometry is used to determine the room temperature complex refractive index (n˜=n+ik)$\left(\right. \overset{˜}{n} = n + i k \left.\right)$ of molecular beam epitaxy grown GaSb1−xBix films with x ≤ 4.25% over a spectral range of 0.47–6.2 eV. By correlating to critical points in the extinction coefficient k, the energies of several interband transitions are extracted as functions of Bi content. The observed change in the fundamental bandgap energy (E0, −36.5 meV per %Bi) agrees well with previously published values; however, the samples examined here show a much more rapid increase in the spin‐orbit splitting energy (Δ0, +30.1 meV per Bi) than previous calculations have predicted. As in the related GaAsBi, the energy of transitions involving the top of the valence band are observed to have a much stronger dependence on Bi content than those that do not, suggesting the valence band maximum is most sensitive to Bi alloying. Finally, the effects of surface droplets on both the complex refractive index and the critical point energies are examined. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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