1. Ultrathin epitaxial NbN superconducting films with high upper critical field grown at low temperature
- Author
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Olivia Licata, Zihao He, Patibandla Nag B, Baishakhi Mazumder, Xiucheng Wei, Mingwei Zhu, Pinku Roy, Cao Yong, Di Zhang, Quanxi Jia, Ping Lu, Haiyan Wang, Zihao Yang, and Hao Zeng
- Subjects
010302 applied physics ,Superconductivity ,Niobium nitride ,Materials science ,business.industry ,epitaxial growth ,Industrial scale ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Epitaxy ,01 natural sciences ,ultrathin superconducting films ,chemistry.chemical_compound ,chemistry ,nbn ,Physical vapor deposition ,0103 physical sciences ,TA401-492 ,Optoelectronics ,General Materials Science ,0210 nano-technology ,business ,Critical field ,physical vapor deposition ,Materials of engineering and construction. Mechanics of materials - Abstract
Ultrathin (5–50 nm) epitaxial superconducting niobium nitride (NbN) films were grown on AlN-buffered c-plane Al2O3 by an industrial scale physical vapor deposition technique at 400°C. Both X-ray diffraction and scanning electron microscopy analysis show high crystallinity of the (111)-oriented NbN films, with a narrow full-width-at-half-maximum of the rocking curve down to 0.030°. The lattice constant decreases with decreasing NbN layer thickness, suggesting lattice strain for films with thicknesses below 20 nm. The superconducting transition temperature, the transition width, the upper critical field, the irreversibility line, and the coherence length are closely correlated to the film thickness. This work realized high quality ultrathin epitaxial NbN films by an industry-scale PVD technology at low substrate temperature, which opens up new opportunities for quantum devices.
- Published
- 2023
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