1. Hybrid gold/DNA nanowire circuit with sub-10 nm nanostructure arrays
- Author
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Byungyou Hong, Deok Ho Kim, Jonathan H. Tsui, Hye Bin Park, Jong Seob Choi, and Hyungjin Kim
- Subjects
Materials science ,Nanostructure ,lcsh:T ,Materials Science (miscellaneous) ,Nanowire ,Nanoparticle ,Nanotechnology ,02 engineering and technology ,Substrate (electronics) ,010402 general chemistry ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,lcsh:Technology ,01 natural sciences ,Industrial and Manufacturing Engineering ,Atomic and Molecular Physics, and Optics ,0104 chemical sciences ,Surface coating ,lcsh:TA1-2040 ,Electrical and Electronic Engineering ,lcsh:Engineering (General). Civil engineering (General) ,0210 nano-technology ,Nanoscopic scale ,Lithography ,Plasma ashing - Abstract
We report on a simple and efficient method for the selective positioning of Au/DNA hybrid nanocircuits using a sequential combination of electron-beam lithography (EBL), plasma ashing, and a molecular patterning process. The nanostructures produced by the EBL and ashing process could be uniformly formed over a 12.6 in2 substrate with sub-10 nm patterning with good pattern fidelity. In addition, DNA molecules were immobilized on the selectively nanopatterned regions by alternating surface coating procedures of 3-(aminopropyl)triethoxysilane (APS) and diamond like carbon (DLC), followed by deposition of DNA molecules into a well-defined single DNA nanowire. These single DNA nanowires were used not only for fabricating Au/DNA hybrid nanowires by the conjugation of Au nanoparticles with DNA, but also for the formation of Au/DNA hybrid nanocircuits. These nanocircuits prepared from Au/DNA hybrid nanowires demonstrate conductivities of up to 4.3 × 105 S/m in stable electrical performance. This selective and precise positioning method capable of controlling the size of nanostructures may find application in making sub-10 nm DNA wires and metal/DNA hybrid nanocircuits. A fabrication method for manufacturing nanoscale circuits with high spatial resolution could provide a boost for high-sensitivity molecular detection devices. Electron-beam lithography (EBL) is a powerful tool for patterning nanowire circuits, but its performance declines at spatial scales of less than 10 nanometers. Researchers led by Dr. Deok-Ho Kim at the Johns Hopkins University and Dr. Hyung Jin Kim at the Gumi Electronics and information Technology Research Institute have overcome this limitation by coupling EBL with a plasma ashing procedure. Using this approach, they were able to precisely pattern nanostructures in a silicon substrate. They subsequently performed a series of chemical modifications that enabled them to couple DNA strands to these patterns, which in turn served as a template for gold nanowires. This strategy could accelerate the production of nanocircuits for biomolecular detection in diagnostics and other applications.
- Published
- 2020