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We report high-resolution (150 nm) nanopatterning of biodegradable polylactide by thermal nanoimprint lithography using dichloromethane as a volatile solvent for improving the liquidity and a porous cyclodextrin-based gas-permeable mold. This study demonstrates the high-resolution patterning of polylactic acid and other non-liquid functional materials with poor fluidity by thermal nanoimprinting. Such a patterning is expected to expand the utility of thermal nanoimprint lithography and fabricate non-liquid functional materials suitable for eco-friendly and biomedical applications. [ABSTRACT FROM AUTHOR]

Plant-based materials have recently been used as eco-friendly, water-repellent, light-transparent films for liquid crystal displays and optical devices. An approach using an eco-friendly light-transparent film derived from psicose has been successfully developed to prepare a regular nanostructure of conical moth-eyes with diameter less than approximately 200 nm, water contact angle of 120°, and relatively low imprint pressure of 9 N for 100 imprints. We report and demonstrate the water repellency of the new eco-friendly film with 97% light transparency prepared with a 40 wt% ratio of plant-based materials using an ultraviolet nanoimprint lithography process. [ABSTRACT FROM AUTHOR]

Sub-400-nm high-resolution and -accuracy nanopatterning of silver nanopaste containing volatile solvents was demonstrated by thermal nanoimprint lithography using a porous, cyclodextrin-based, gas-permeable mold for the application of high-surface-area heat sinks. The silver nanoparticles have desirable heat-radiation characteristics. However, high-resolution and accurate nanopatterning of silver nanoparticles by thermal nanoimprint lithography is challenging because volatile dilution solvents, which are contained in nanoparticle pastes for high fluidity, can be trapped by gas-impermeable molds to cause pattern failures. The normalized heat-transfer amount of the 380-nm dense-line pattern of silver was calculated to be three times than that of the existing 10-μm dense-line pattern. [ABSTRACT FROM AUTHOR]