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Atomic hydrogen dry etching was used for microstructure fabrication. Photolithography was proposed and achieved by a dry development process using atomic hydrogen irradiation. The reaction system of poly(methyl methacrylate) mixed with molecular benzophenone was examined as a model system for a proof-of-concept study. Optical patterning was experimentally made on a thin layer of poly(methyl methacrylate) with benzophenone by UV light exposure with a photomask. The reaction system acted as a negative tone resist in the proposed process. Thus, a model system for a new atomic hydrogen dry development process was proposed and successfully demonstrated. [ABSTRACT FROM AUTHOR]

This paper discusses the fabrication method of Poly(vinylidene fluoride) (1) crystal having excellent dielectric properties. We tried to control crystal structure of PVDF in the blend films of PVDF and Poly(methyt methacrylate) (PMMA) prepared by solvent casting. PVDF/PMMA = 60/ 40wt.% blend was dissolved in DMF solvent at 120°C. After casting, the PVDF/PMMA blend films were baked at 150°C (B). Each film was quenched (Q) from melting state and then was annealed at 120°C (QA). As a result, we demonstrated that PVDF (I) crystal grows preferentially under the existence of PMMA. That the crystallization speed of the quenched and annealed PVDF/PMMA blend films (QA) with the blend ratio of PVDF/ PMMA = 60/40wt.% is comparatively slow and forms the PVDF (I) crystal. [ABSTRACT FROM AUTHOR]

This paper discusses the decomposition processes of polymer thin films coated on silicon (Si) substrates by hydrogen radicals generated from H 2 on hot-wire catalyst surfaces. N 2 buffer was used to relax the translational motion of hydrogen radicals. It is shown that H atoms react to polymer films under thermal equilibrium conditions when the total pressure is 21.3 Pa and the distance between the catalyst and the substrate is 100 mm. Polymers with benzene ring such as phenol resin, polystyrene, poly(vinylphenol), and poly(α-methylstyrene) exhibited both low removal rate and high activation energy of decomposition compared to those polymers without benzene ring such as poly(methylmethacrylate) and poly(isobutylene). We concluded that benzene ring with CC bond and resonance structure is resistant to decomposition by hydrogen radicals. [ABSTRACT FROM AUTHOR]