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A memristor1 has been proposed as an artificial synapse for emerging neuromorphic computing applications2,3. To train a neural network in memristor arrays, changes in weight values in the form of device conductance should be distinct and uniform3. An electrochemical metallization (ECM) memory4,5, typically based on silicon (Si), has demonstrated a good analogue switching capability6,7 owing to the high mobility of metal ions in the Si switching medium8. However, the large stochasticity of the ion movement results in switching variability. Here we demonstrate a Si memristor with alloyed conduction channels that shows a stable and controllable device operation, which enables the large-scale implementation of crossbar arrays. The conduction channel is formed by conventional silver (Ag) as a primary mobile metal alloyed with silicidable copper (Cu) that stabilizes switching. In an optimal alloying ratio, Cu effectively regulates the Ag movement, which contributes to a substantial improvement in the spatial/temporal switching uniformity, a stable data retention over a large conductance range and a substantially enhanced programmed symmetry in analogue conductance states. This alloyed memristor allows the fabrication of large-scale crossbar arrays that feature a high device yield and accurate analogue programming capability. Thus, our discovery of an alloyed memristor is a key step paving the way beyond von Neumann computing.

Although conventional homoepitaxy forms high-quality epitaxial layers1-5, the limited set of material systems for commercially available wafers restricts the range of materials that can be grown homoepitaxially. At the same time, conventional heteroepitaxy of lattice-mismatched systems produces dislocations above a critical strain energy to release the accumulated strain energy as the film thickness increases. The formation of dislocations, which severely degrade electronic/photonic device performances6-8, is fundamentally unavoidable in highly lattice-mismatched epitaxy9-11. Here, we introduce a unique mechanism of relaxing misfit strain in heteroepitaxial films that can enable effective lattice engineering. We have observed that heteroepitaxy on graphene-coated substrates allows for spontaneous relaxation of misfit strain owing to the slippery graphene surface while achieving single-crystalline films by reading the atomic potential from the substrate. This spontaneous relaxation technique could transform the monolithic integration of largely lattice-mismatched systems by covering a wide range of the misfit spectrum to enhance and broaden the functionality of semiconductor devices for advanced electronics and photonics.

Atomic layer deposition is a chemical deposition technology that provides ultimate control over the conformality of films and their thickness, even down to Angstrom-scale precision. Based on the marked superficial character and gas phase process of the technique, metal sources and their ligands shall ideally be highly volatile. However, in numerous cases those ligands corrode the substrate or compete for adsorption sites, well-known as side reactions of these processes. Therefore, the ability to control such side reactions might be of great interest, since it could achieve synchronous coating and alteration of a substrate in one process, saving time and energy otherwise needed for a post-treatment of the sample. Consequently, advances in this way must require understanding and control of the chemical processes that occur during the coating. In this work, we show how choosing an appropriate ligand of the metal source can unveil a novel approach to concertedly coat and reduce γ-Fe2O3 nanoparticles to form a final product composed of Fe3O4/TiO2 core/shell nanoparticles. To this aim, we envisage that appropriate design of precursors and selection of substrates will pave the way for numerous new compositions, while the ALD process itself allows for easy upscaling to large amounts of coated and reduced particles for industrial use.

It has recently been shown that quantum-confined states can appear in epitaxially grown van der Waals material heterobilayers without a rotational misalignment ($\theta=0^\circ$), associated with flat bands in the Brillouin zone of the moir\'e pattern formed due to the lattice mismatch of the two layers. Peaks in the local density of states and confinement in a MoS$_2$/WSe$_2$ system was qualitatively described only considering local stacking arrangements, which cause band edge energies to vary spatially. In this work, we report the presence of large in-plane strain variation across the moir\'e unit cell of a $\theta=0^\circ$ MoS$_2$/WSe$_2$ heterobilayer, and show that inclusion of strain variation and out-of-plane displacement in density functional theory calculations greatly improves their agreement with the experimental data. We further explore the role of twist-angle by showing experimental data for a twisted MoS$_2$/WSe$_2$ heterobilayer structure with twist angle of $\theta=15^\circ$, that exhibits a moir\'e pattern but no confinement., Comment: 13 pages, 6 figures in main text. Supporting information included with 13 pages, 8 figures, and 2 tables

International audience; The transparency of two-dimensional (2D) materials to intermolecular interactions of crystalline materials has been an unresolved topic. Here we report that remote atomic interaction through 2D materials is governed by the binding nature, that is, the polarity of atomic bonds, both in the underlying substrates and in 2D material interlayers. Although the potential field from covalent-bonded materials is screened by a monolayer of graphene, that from ionic-bonded materials is strong enough to penetrate through a few layers of graphene. Such field penetration is substantially attenuated by 2D hexagonal boron nitride, which itself has polarization in its atomic bonds. Based on the control of transparency, modulated by the nature of materials as well as interlayer thickness, various types of single-crystalline materials across the periodic table can be epitaxially grown on 2D material-coated substrates. The epitaxial films can subsequently be released as free-standing membranes, which provides unique opportunities for the heterointegration of arbitrary single-crystalline thin films in functional applications.

Advances in ex situ and in situ (operando) characteristic techniques have unraveled unprecedented atomic details in the electrochemical reaction of Li-ion batteries. To bridge the gap between emerging evidences and practical material development, an elaborate understanding on the electrochemical properties of cathode materials on the atomic scale is urgently needed. In this work, we perform comprehensive first-principle calculations within the density functional theory + U framework on the surface stability, morphology, and elastic anisotropy of Ni-rich LiNi1-2yCoyMnyO2 (NCM) (y ≤ 0.1) cathode materials, which are strongly related to the emerging evidence in the degradation of Li-ion batteries. On the basis of the surface stability results, the equilibrium particle morphology is obtained, which is mainly determined by the oxygen chemical potential. Ni-rich NCM particles are terminated mostly by the (012) and (001) surfaces for oxygen-poor conditions, whereas the termination corresponds to the (104) and (001) surfaces for oxygen-rich conditions. Besides, Ni surface segregation predominantly occurs on the (100), (110), and (104) nonpolar surfaces, showing a tendency to form a rocksalt NiO domain on the surface because of severe Li-Ni exchange. The observed elastic anisotropy reveals that an uneven deformation is more likely to be formed in the particles synthesized under poor-oxygen conditions, leading to crack generation and propagation. Our findings provide a deep understanding of the surface properties and degradation of Ni-rich NCM particles, thereby proposing possible solution mechanisms to the factors affecting degradation, such as synthesis conditions, coating, or novel nanostructures.

Two-dimensional materials have shown great promise for implementation in next-generation devices. However, controlling the film thickness during epitaxial growth remains elusive and must be fully understood before wide scale industrial application. Currently, uncontrolled multilayer growth is frequently observed, and not only does this growth mode contradict theoretical expectations, but it also breaks the inversion symmetry of the bulk crystal. In this work, a multiscale theoretical investigation aided by experimental evidence is carried out to identify the mechanism of such an unconventional, yet widely observed multilayer growth in the epitaxy of layered materials. This work reveals the subtle mechanistic similarities between multilayer concentric growth and spiral growth. Using the combination of experimental demonstration and simulations, this work presents an extended analysis of the driving forces behind this non-ideal growth mode, and the conditions that promote the formation of these defects. Our study shows that multilayer growth can be a result of both chalcogen deficiency and chalcogen excess: the former causes metal clustering as nucleation defects, and the latter generates in-domain step edges facilitating multilayer growth. Based on this fundamental understanding, our findings provide guidelines for the narrow window of growth conditions which enables large-area, layer-by-layer growth.

To achieve efficient degradation of pharmaceutical and personal care products (PPCPs), dual reaction centers ZnO@FePc photo-Fenton catalysts with high-speed electron transmission channel were designed through surface hydroxyl-induced assembly. In ZnO@FePc catalytic system, the photocatalysis center of ZnO and Fenton catalytic center of FePc were formed simultaneously. Concept and process for the control of hydroxyl groups to construct a dual reaction center ZnO@FePc photo-Fenton catalyst were verified ingeniously based on the density functional theory (DFT) analysis and experimental results. A series of catalysts, including ZIF-8 (400 ℃-N2), FePc (400 ℃-N2), ZIF-8 (400 ℃)-FePc (400 ℃) and ZnO@FePc were prepared and characterized by XRD, FTIR, TEM, BET, XPS, PL and DRS, respectively. The ZnO@FePc catalyst showed superior performance for the photo-Fenton degradation of ibuprofen, affording degradation rate larger than 90 % within just 10 min under simulateed sunlight. The excellent performance of ZnO@FePc catalyst is mainly attributed to the synergistic effect between dual reaction centers of ZnO@FePc. This work provides a novel method to construct dual reaction centers ZnO@FePc catalyst with efficient photo-generated electrons transmission link and to strengthen the synergistic effect of dual reaction centers.

Conventional mechanical or chemical exfoliation approach of 2D material synthesis is largely dependent on the inherent structure of the parent material, i.e., whether it is a layered structure or a 3D bulk structure with embedded 2D substructures. A recent experiment demonstrated that unprecedented atomically thin metal oxides without bulk layered structures can be synthesized by using liquid metals. Supported by an experimental realization of atomically thin W layers through the metal atomic layer deposition method, we propose a new type of transition metal (TM)-based 2D materials that can be stabilized at the oxide interfaces with oxide substrates and overlayers. Based on the ab initio density functional theory calculations, we show that most of the TM elements can form unprecedented atomically thin 2D materials by the surface oxygen passivation, which is available from the oxide substrate and the overlayer. The stabilized 2D TM layers show diverse electronic and magnetic properties. Our results suggest a novel way to extend 2D materials study and a possible application of those 2D TM layers embedded in oxides.

Controlled growth of crystalline solids is critical for device applications, and atomistic modeling methods have been developed for bulk crystalline solids. Kinetic Monte Carlo (KMC) simulation method provides detailed atomic scale processes during a solid growth over realistic time scales, but its application to the growth modeling of van der Waals (vdW) heterostructures has not yet been developed. Specifically, the growth of single-layered transition metal dichalcogenides (TMDs) is currently facing tremendous challenges, and a detailed understanding based on KMC simulations would provide critical guidance to enable controlled growth of vdW heterostructures. In this work, a KMC simulation method is developed for the growth modeling on the vdW epitaxy of TMDs. The KMC method has introduced full material parameters for TMDs in bottom-up synthesis: metal and chalcogen adsorption/desorption/diffusion on substrate and grown TMD surface, TMD stacking sequence, chalcogen/metal ratio, flake edge diffusion and vacancy diffusion. The KMC processes result in multiple kinetic behaviors associated with various growth behaviors observed in experiments. Different phenomena observed during vdW epitaxy process are analysed in terms of complex competitions among multiple kinetic processes. The KMC method is used in the investigation and prediction of growth mechanisms, which provide qualitative suggestions to guide experimental study.

Atomic substitution and doping are two of the most adopted strategies to improve the electrochemical performance of layered cathode materials for Li-ion batteries (LIBs). In this work, we report a comprehensive study on the effects of seven dopants (Al, Ga, Mg, Si, Ti, V, and Zr) on the well-known drawbacks of Ni-rich LiNi1−2yCoyMnyO2 (NCM) (y ≤ 0.1), one of the most promising next-generation cathode materials for LIBs, including phase instability, Li–Ni exchange, Ni segregation, lattice distortion, and oxygen evolution. Our results show that there is not a single dopant that can solve all the problems at the same time and, moreover, while they often improve certain properties, they may have no effect or even worsen others. By comparing different doping sites, we found a strong site preference due to the tradeoff between Mn and Co concentrations. This site preference indicates that a multicomponent-doping strategy should be adopted at both Mn and Co sites. Finally, a rationale for the optimization of the overall electrochemical performance of Ni-rich NCM is proposed, which will ultimately provide practical guidance (Ti or Zr at the Co site and Al at the Mn site) for the design of new Ni-rich layered cathode materials for LIBs.

By investigating the bulk superconducting state via dc magnetization measurements, we have discovered a common resurgence of the superconductive transition temperatures (Tcs) of the monolayer Bi2Sr2CuO6+{\delta} (Bi2201) and bilayer Bi2Sr2CaCu2O8+{\delta} (Bi2212) to beyond the maximum Tcs (Tc-maxs) predicted by the universal relation between Tc and doping (p) or pressure (P) at higher pressures. The Tc of under-doped Bi2201 initially increases from 9.6 K at ambient to a peak at ~ 23 K at ~ 26 GPa and then drops as expected from the universal Tc-P relation. However, at pressures above ~ 40 GPa, Tc rises rapidly without any sign of saturation up to ~ 30 K at ~ 51 GPa. Similarly, the Tc for the slightly overdoped Bi2212 increases after passing a broad valley between 20-36 GPa and reaches ~ 90 K without any sign of saturation at ~ 56 GPa. We have therefore attributed this Tc-resurgence to a possible pressure-induced electronic transition in the cuprate compounds due to a charge transfer between the Cu 3d_(x^2-y^2 ) and the O 2p bands projected from a hybrid bonding state, leading to an increase of the density of states at the Fermi level, in agreement with our density functional theory calculations. Similar Tc-P behavior has also been reported in the trilayer Br2Sr2Ca2Cu3O10+{\delta} (Bi2223). These observations suggest that higher Tcs than those previously reported for the layered cuprate high temperature superconductors can be achieved by breaking away from the universal Tc-P relation through the application of higher pressures., Comment: 13 pages, including 5 figures

In this Letter, we use first-principles simulations to demonstrate the absence of Fermi-level pinning when graphene is in contact with transition metal dichalcogenides (TMDs). We find that formation of either an ohmic or Schottky contact is possible. Then we show that, due to the shallow density of states around its Fermi level, the work function of graphene can be tuned by ion adsorption. Finally we combine work function tuning of graphene and an ideal contact between graphene and TMDs to propose an ionic barristor design that can tune the work function of graphene with a much wider margin than current barristor designs, achieving a dynamic switching among p-type ohmic contact, Schottky contact, and n-type ohmic contact in one device.

Two-dimensional tungsten diselenide (WSe2) has been used as a component in atomically thin photovoltaic devices, field effect transistors, and tunneling diodes in tandem with graphene. In some applications it is necessary to achieve efficient charge transport across the interface of layered WSe2-graphene, a semiconductor to semimetal junction with a van der Waals (vdW) gap. In such cases, band alignment engineering is required to ensure a low-resistance, ohmic contact. In this work, we investigate the impact of graphene electronic properties on the transport at the WSe2-graphene interface. Electrical transport measurements reveal a lower resistance between WSe2 and fully hydrogenated epitaxial graphene (EG(FH)) compared to WSe2 grown on partially hydrogenated epitaxial graphene (EGPH). Using low-energy electron microscopy and reflectivity on these samples, we extract the work function difference between the WSe2 and graphene and employ a charge transfer model to determine the WSe2 carrier density in both cases. The results indicate that WSe2-EG(FH) displays ohmic behavior at small biases due to a large hole density in the WSe2, whereas WSe2-EG(PH) forms a Schottky barrier junction.

Quantum Hall effect (QHE) is a macroscopic manifestation of quantized states that only occurs in confined two-dimensional electron gas (2DEG) systems. Experimentally, QHE is hosted in high-mobility 2DEG with large external magnetic field at low temperature. Two-dimensional van der Waals materials, such as graphene and black phosphorus, are considered interesting material systems to study quantum transport because they could unveil unique host material properties due to the easy accessibility of monolayer or few-layer thin films at the 2D quantum limit. For the first time, we report direct observation of QHE in a novel low-dimensional material system, tellurene. High-quality 2D tellurene thin films were acquired from recently reported hydrothermal method with high hole mobility of nearly 3000 cm2/(V s) at low temperatures, which allows the observation of well-developed Shubnikov-de Haas (SdH) oscillations and QHE. A four-fold degeneracy of Landau levels in SdH oscillations and QHE was revealed. Quantum oscillations were investigated under different gate biases, tilted magnetic fields, and various temperatures, and the results manifest the inherent information on the electronic structure of Te. Anomalies in both temperature-dependent oscillation amplitudes and transport characteristics were observed that are ascribed to the interplay between the Zeeman effect and spin-orbit coupling, as depicted by the density functional theory calculations.

Atomically thin transition metal dichalcogenides (TMDs) are of interest for next-generation electronics and optoelectronics. Here, we demonstrate device-ready synthetic tungsten diselenide (WSe2) via metal–organic chemical vapor deposition and provide key insights into the phenomena that control the properties of large-area, epitaxial TMDs. When epitaxy is achieved, the sapphire surface reconstructs, leading to strong 2D/3D (i.e., TMD/substrate) interactions that impact carrier transport. Furthermore, we demonstrate that substrate step edges are a major source of carrier doping and scattering. Even with 2D/3D coupling, transistors utilizing transfer-free epitaxial WSe2/sapphire exhibit ambipolar behavior with excellent on/off ratios (∼107), high current density (1–10 μA·μm–1), and good field-effect transistor mobility (∼30 cm2·V–1·s–1) at room temperature. This work establishes that realization of electronic-grade epitaxial TMDs must consider the impact of the TMD precursors, substrate, and the 2D/3D inte...

Using the Bardeen tunneling method with first-principles wave functions, computations are made of the tunneling current in graphene/hexagonal-boron-nitride/graphene (G/h-BN/G) vertical structures. Detailed comparison with prior experimental results is made, focusing on the magnitude of the achievable tunnel current. With inclusion of the effects of translational and rotational misalignment of the graphene and the h-BN, predicted currents are found to be about 15× larger than experimental values. A reduction in this discrepancy, to a factor of 2.5×, is achieved by utilizing a realistic size for the band gap of the h-BN, hence affecting the exponential decay constant for the tunneling.

To overcome the limitation of conventional fixed charge potential methods for the study of Li-ion battery cathode materials, a dynamic charge potential method, charge-transfer modified embedded atom method (CT-MEAM), has been developed and applied to the Li-Co-O ternary system. The accuracy of the potential has been tested and validated by reproducing a variety of structural and electrochemical properties of LiCoO2. A detailed analysis on the local charge distribution confirmed the capability of this potential for dynamic charge modeling. The transferability of the potential is also demonstrated by its reliability in describing Li-rich Li2CoO2 and Li-deficient LiCo2O4 compounds, including their phase stability, equilibrium volume, charge states and cathode voltages. These results demonstrate that the CT-MEAM dynamic charge potential could help to overcome the challenge of modeling complex ternary transition metal oxides. This work can promote molecular dynamics studies of Li ion cathode materials and other important transition metal oxides systems that involve complex electrochemical and catalytic reactions.

Chemical and physical adsorption of a H 2 O molecule on a Zr (0 0 0 1) surface is studied by first principle calculations. A surface zirconium atom is substituted by a metal element atom in the 4th and 5th period of the periodic table to investigate the doping effect on the water adsorption. Doping elements Ge, Sn, Sb, Zn, Ga, Ru, Rh, Pd, Ag, Cr, Mn, Fe, Co, Ni, Cu, Nb, and Mo can increase the oxidation resistance. This strategy can be used to design high oxidation resistance cladding material for light water reactor.

The atomic layer deposition (ALD) of high-k dielectrics could build an efficient barrier against moisture and O2 adsorption. Such a barrier is highly needed for MoTe2 and WTe2 transition metal dichalcogenides because of the poor structural stability and the fast oxidization in ambient air. In situ x-ray photoelectron spectroscopy and ex situ atomic force microscopy and scanning transmission electron microscopy were employed to report a comparative study between the growth of Al2O3 on MoTe2 and WTe2 by means of traditional thermal ALD and plasma-enhanced ALD (PEALD). Similar to what has been observed on other 2D materials such as MoS2 and Graphene, the thermal ALD results in an islanding growth of Al2O3 on MoTe2 due to the dearth of dangling bonds, whereas, a uniform coverage of Al2O3 on WTe2 is observed and likely contributed to the high concentration of intrinsic structural defects. The PEALD behavior is consistent between MoTe2 and WTe2 providing a conformal and linear growth rate (∼0.08 nm/cycle), which correlates with the creation of Te-O and metal-O nucleation sites. However, a thin layer of interfacial Mo or W oxides gradually forms, resulting from the plasma-induced damage in the topmost (1-2) layers. Attempts to enhance the Al2O3/MoTe2 interfacial quality by physically evaporating an Al2O3 seed layer are investigated as well. However, the evaporated Al2O3 process causes thermal damage on MoTe2, necessitating a more 'gentle' ALD technique for the surface passivation.

The authors investigate the thermodynamic and electronic properties of few- and monolayer MoS2 using density functional theory. They calculate the formation energies of S vacancies and the doping effect of C and O under various chemical environments which are commonly observed during MoS2 deposition. The results show that in the oxidizing condition, O readily gets incorporated into the MoS2 layer and assists in C doping. They analyze the bandgap and density of states of MoS2 at different concentrations of defect. They find that the bandgap decreases as the defect concentration increases, wherein the ordering of S vacancies has a more significant influence than that of the other two defects. The S vacancy and C dopants generate deep acceptor gap states within the bandgap of MoS2, while O dopant states are delocalized. They also observe that the carbon dopants form penetrative dimers, which lead to shallow acceptor states. This work contributes to the understanding of defect/impurity incorporation during deposition and prediction of electronic behavior of deposited low-quality MoS2 materials.The authors investigate the thermodynamic and electronic properties of few- and monolayer MoS2 using density functional theory. They calculate the formation energies of S vacancies and the doping effect of C and O under various chemical environments which are commonly observed during MoS2 deposition. The results show that in the oxidizing condition, O readily gets incorporated into the MoS2 layer and assists in C doping. They analyze the bandgap and density of states of MoS2 at different concentrations of defect. They find that the bandgap decreases as the defect concentration increases, wherein the ordering of S vacancies has a more significant influence than that of the other two defects. The S vacancy and C dopants generate deep acceptor gap states within the bandgap of MoS2, while O dopant states are delocalized. They also observe that the carbon dopants form penetrative dimers, which lead to shallow acceptor states. This work contributes to the understanding of defect/impurity incorporation during de...

Author(s): Pan, Y; Folsch, S; Lin, YC; Jariwala, B; Robinson, JA; Nie, Y; Cho, K; Feenstra, RM | Abstract: Scanning tunneling microscopy (STM) at 5 K is used to study WSe2 layers grown on epitaxial graphene which is formed on Si-terminated SiC(0 0 0 1). Specifically, a partial hydrogenation process is applied to intercalate hydrogen at the SiC-graphene interface, yielding areas of quasi-free-standing bilayer graphene coexisting with bare monolayer graphene. We find that an abrupt and structurally perfect homojunction (band-edge offset ∼0.25 eV) is formed when WSe2 overgrows a lateral junction between adjacent monolayer and quasi-free-standing bilayer areas in the graphene. The band structure modulation in the WSe2 overlayer arises from the varying work function (electrostatic potential) of the graphene beneath. Scanning tunneling spectroscopy measurements reveal that this effect can be also utilized to create WSe2 quantum dots that confine either valence or conduction band states, in agreement with first-principles band structure calculations.

Metal-insulator transitions in low-dimensional materials under ambient conditions are rare and worth pursuing due to their intriguing physics and rich device applications. Monolayer MoTe2 and WTe2 are distinguished from other TMDs by the existence of an exceptional semimetallic distorted octahedral structure (T') with a quite small energy difference from the semiconducting H phase. In the process of transition metal alloying, an equal stability point of the H and the T' phase is observed in the formation energy diagram of monolayer WxMo1-xTe2. This thermodynamically driven phase transition enables a controlled synthesis of the desired phase (H or T') of monolayer WxMo1-xTe2 using a growth method such as chemical vapor deposition (CVD) and molecular beam epitaxy (MBE). Furthermore, charge mediation, as a more feasible method, is found to make the T' phase more stable than the H phase and induce a phase transition from the H phase (semiconducting) to the T' phase (semimetallic) in monolayer WxMo1-xTe2 alloy. This suggests that a dynamic metal-insulator phase transition can be induced, which can be exploited for rich phase transition applications in two-dimensional nanoelectronics.

The limited grain size (

Two-dimensional transition metal dichalcogenides (TMDs) are promising low-dimensional materials which can produce diverse electronic properties and band alignment in van der Waals heterostructures. Systematic density functional theory (DFT) calculations are performed for 24 different TMD monolayers and their bilayer heterostacks. DFT calculations show that monolayer TMDs can behave as semiconducting, metallic or semimetallic depending on their structures; we also calculated the band alignment of the TMDs to predict their alignment in van der Waals heterostacks. We have applied the charge equilibration model (CEM) to obtain a quantitative formula predicting the highest occupied state of any type of bilayer TMD heterostacks (552 pairs for 24 TMDs). The CEM predicted values agree quite well with the selected DFT simulation results. The quantitative prediction of the band alignment in the TMD heterostructures can provide an insightful guidance to the development of TMD-based devices.

Tungsten diselenide (WSe2) is a semiconducting, two-dimensional (2D) material that has gained interest in the device community recently due to its electronic properties. The synthesis of atomically thin WSe2, however, is still in its infancy. In this work we elucidate the requirements for large selenium/tungsten precursor ratios and explain the effect of nucleation temperature on the synthesis of WSe2 via metal-organic chemical vapor deposition (MOCVD). The introduction of a nucleation-step prior to growth demonstrates that increasing nucleation temperature leads to a transition from a Volmer–Weber to Frank–van der Merwe growth mode. Additionally, the nucleation step prior to growth leads to an improvement of WSe2 layer coverage on the substrate. Finally, we note that the development of this two-step technique may allow for improved control and quality of 2D layers grown via CVD and MOCVD processes.