1. Mechanical stress field assisted charge de-trapping in carbon doped oxides
- Author
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M. A. Haque, M. T. Alam, J. Bielefeld, K. E. Maletto, and Sean W. King
- Subjects
Materials science ,Field (physics) ,Dielectric strength ,Oxide ,Dielectric ,Condensed Matter Physics ,Thermal conduction ,Atomic and Molecular Physics, and Optics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,chemistry.chemical_compound ,chemistry ,Electric field ,Electronic engineering ,Electrical and Electronic Engineering ,Composite material ,Thin film ,Safety, Risk, Reliability and Quality ,Porosity - Abstract
Leakage current and dielectric breakdown effects are conventionally studied under electrical fields alone, with little regard for mechanical stresses. In this letter, we demonstrate that mechanical stress can influence the reliability of dielectrics even at lower field strengths. We applied tensile stress (up to 8 MPa) to a 33% porous, 504 nm thick carbon doped oxide thin film and measured the leakage current at constant electrical fields (up to 2.5 MV/cm). The observed increase in leakage current at relatively low electric fields suggests that mechanical stress assists in trap/defect mediated conduction by reducing the energy barrier potential to de-trap charges in the dielectric.
- Published
- 2015
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