1. Material and Device Structure Designs for 2D Memory Devices Based on the Floating Gate Voltage Trajectory
- Author
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Takashi Taniguchi, Tomonori Nishimura, Kosuke Nagashio, Kenji Watanabe, Keiji Ueno, and Taro Sasaki
- Subjects
Materials science ,business.industry ,Ambipolar diffusion ,General Engineering ,General Physics and Astronomy ,Heterojunction ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,0104 chemical sciences ,Non-volatile memory ,Reliability (semiconductor) ,Electrode ,Optoelectronics ,General Materials Science ,0210 nano-technology ,business ,Quantum tunnelling ,Communication channel ,Voltage - Abstract
Two-dimensional heterostructures have been extensively investigated as next-generation nonvolatile memory (NVM) devices. In the past decade, drastic performance improvements and further advanced functionalities have been demonstrated. However, this progress is not sufficiently supported by the understanding of their operations, obscuring the material and device structure design policy. Here, detailed operation mechanisms are elucidated by exploiting the floating gate (FG) voltage measurements. Systematic comparisons of MoTe2, WSe2, and MoS2 channel devices revealed that the tunneling behavior between the channel and FG is controlled by three kinds of current-limiting paths, i.e., tunneling barrier, 2D/metal contact, and p-n junction in the channel. Furthermore, the control experiment indicated that the access region in the device structure is required to achieve 2D channel/FG tunneling by preventing electrode/FG tunneling. The present understanding suggests that the ambipolar 2D-based FG-type NVM device with the access region is suitable for further realizing potentially high electrical reliability.
- Published
- 2021
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