1. Monolithic optical microlithography of high-density elastic circuits
- Author
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Chenxin Zhu, Hung-Chin Wu, Helen Tran, Zhenan Bao, Donglai Zhong, Zhiao Yu, Jinxing Li, Jeffrey B.-H. Tok, Shuhan Liu, Yuxin Liu, Deyu Liu, Yu-Qing Zheng, and Shayla Nikzad
- Subjects
Adder ,Multidisciplinary ,Materials science ,business.industry ,Stretchable electronics ,Transistor ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,Signal ,0104 chemical sciences ,law.invention ,Arithmetic logic unit ,Nanolithography ,law ,Optoelectronics ,0210 nano-technology ,business ,XOR gate ,Electronic circuit - Abstract
Direct optical polymer patterning As a platform for electronic devices, polymeric materials offer the advantages of intrinsic flexibility and stretchability relative to hard material devices. However, unlike materials such as silicon, there are few tools for large-scale patterning of monolithic devices. Zheng et al. developed an optical lithography technique for the high-throughput fabrication of transistor circuitry on stretchable substrates. In this method, ultraviolet light is used to control the local solubility of the polymer, which makes it possible to fabricate transistors on the micrometer scale. These devices can be made with high yield and excellent uniformity without compromising their electronic and mechanical characteristics. Science , abh3551, this issue p. 88
- Published
- 2021
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