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A novel kind of highly efficient photoanode was constructed with a SbSI/WO3 heterostructurefabricated through two hydrothermal reactions followed by an iodination reaction (WO3 → Sb2S3/WO3 → SbSI/WO3). After optimizing the solvent [carbon disulfide (CS2)] for SbI3, the SbSI(CS2)/WO3 photoanode shows high-density single-crystalline SbSI nanorods growing along the polar [001] direction on WO3 nanoplates, resulting in excellent photocurrent performance (∼2.1 mA cm−2@1.23 V vs. RHE) and an improved photostability. It is evidenced that the higher crystallinity of SbSI has a positive effect on the photostability of the constructed SbSI/WO3 photoanodes.

Although carbon fiber reinforced epoxy composites (CF/EP) have been widely used in many fields, it is still unknown if such composites could be used in extreme environments exposed to high-intensity thermal radiation that could result in severe damage to materials. In this case, CF/CP has been prepared through thermocompression method and the thermal radiation experiment has been designed and performed. The obtained results show that the parameters including irradiation power density and irradiation time directly affect the damage degree. After irradiation with 4–6 W cm−2 of thermal radiation, decomposition occurred in all CF/EP composites. In addition, the numerical simulation method was used to calculate the effect process, and the results showed that when the thermal radiation coefficient was 0.88, the calculated temperature history was consistent with that of the experiment. After irradiated at 6 W cm−2 for 30 s, the decomposition thickness reaches to 0.7 mm, indicating the high-intensity thermal radiation has caused an obvious effect on CF/EP.

Mn-implanted Si with postannealing treatment at 873, 973, 1073, and 1173 K exhibited ferromagnetism at room temperature. Ferromagnetism was enhanced as the annealing temperature increased. The largest value of saturation magnetization was found in the sample annealed at 1173 K. X-ray absorption near-edge structure spectra showed no formation of substitutional–interstitial Mn–Mn dimmers in all samples. On the other hand, high-resolution transmission electron microscopy and glancing incidence X-ray diffraction revealed a variety of MnSi compounds. We propose that the ferromagnetism has the origin from the MnSi1.7 nanoparticles as well as the MnSi 1:1 phase, which possesses strong short-range spin correlation. The formation of antiferromagnetic Mn5Si3 compound in 873 and 973 K annealed samples substantially reduced the magnetism. This paper provides new insights into the understanding of ferromagnetism in Mn-implanted Si diluted magnetic semiconductors.

Si 1− x Mn x diluted magnetic semiconductor films were deposited on p-type Si(1 0 0) substrate by radio frequency magnetron sputtering method. Post thermal annealing was performed in an argon atmosphere at 1073 K for 300 s and at 1473 K for 120 s. The as-grown sample exhibits ferromagnetism at room temperature. Ferromagnetism is enhanced after annealing treatment. High resolution transmission electron microscopy shows that only Mn 4 Si 7 compound formed in all samples. X-ray diffraction patterns and Fast Fourier Transform image indicate Mn atoms incorporated into Si lattice upon annealing. X-ray absorption fine structure suggests the formation of substitutional–tetrahedral interstitial Mn–Mn and tetrahedral interstitial–substitutional–tetrahedral interstitial Mn–Mn–Mn complexes in the 1473 K annealed sample, which possesses the strongest ferromagnetism.

Si 1− x Mn x diluted magnetic semiconductor films were deposited on the p-Si (100) single crystal wafer using magnetron sputtering method. Post-rapid thermal annealing treatments were performed at temperatures of 700 °C, 800 °C, and 900 °C in an argon atmosphere for approximately 5 min. Alternating gradient magnetometer, scanning electron microscope, atomic force microscope, X-ray diffraction and X-ray absorption near-edge structure spectra were employed to characterize magnetic properties and structure of the as-grown and annealed films. The films were about 2.8 μm thick and the RMS roughness of the surface was about 5–10 nm. All samples exhibit ferromagnetism at room temperature and the saturation magnetization reaches at the maximum value for the sample annealed at 700 °C. The silicide MnSi 1.7 was observed in the annealed samples. X-ray absorption near-edge structure spectra indicated that Mn atoms preferred to occupy substitutional or interstitial sites instead of precipitating to form silicide when annealing at 700 °C. It is inferred that the observed ferromagnetism is attributed to the interstitial and substitutional Mn dimers, which existed mostly in the sample annealed at 700 °C. The weaker ferromagnetism of the 900 °C annealed sample was closely related to the increased content of Mn 4 Si 7 compound.

Polycrystalline Si 1 − x Cr x thin films have been prepared by magnetron sputtering followed by rapid thermal annealing (RTA) for crystallization. RTA was performed at 800 °C for 5 min, 1200 °C for 30 s and 1200 °C for 2 min, in a N 2 flow. The magnetic hysteresis loops were observed at room temperature in all the samples except for RTA at 800 °C for 5 min, and the annealing caused the decrease of saturation magnetization relative to the as-grown film. X-ray diffraction spectra and Raman spectra showed that the annealing process lead the deposited amorphous film to be crystallized and CrSi 2 phase formed. The magnetism of the films was determined by the competition between crystallinity and precipitation of diamagnetic CrSi 2 phase.

Neutron diffraction and Scanning Electron Microscope (SEM) were employed to study complex two-phase coexistence structure and surface morphology of CaO-Al2O3-SiO2(ZnO-BaO-Na2O) glass ceramics prepared under different cooling conditions. With the rapid cooling temperature decreasing from above 850°C to 750°C and 300°C, the length of the needle-like precipitated β-wollastonite crystal decreased from 30 μm to 15 μm and 5 μm, respectively. Meanwhile, the transgranular fracture appeared and the grain boundary became indistinct in the sample rapidly cooled to 750°C, and the microcracks appeared in the samples rapidly cooled to 300°C and below. These phenomena contribute to the decrease of bending strength for the rapid cooling. Neutron diffraction revealed that the unit cell of precipitated β-wollastonite crystal elongated along its three axes and its volume increased at different cooling conditions. With the decrease of the cooling temperature, the elongation of axes and increase of volume were enhanced, implying that the tensile stress of the β-wollastonite crystal increased. At the same time, intensity of the crystal diffraction peaks increased and atomic temperature factors decreased, which revealed that defects inside a smaller size of crystal granular were less than that in larger one. Amorphous peaks at low diffraction angle did not changed with cooling temperature, showing that the middle-range-order inside residual glass phases were almost the same for all cooling conditions, while intensity of amorphous peaks at high diffraction angle increased notably for samples rapidly cooled to below 850°C, showing that rapid cooling may result in severe short-range-order in residual glass phase, which induced tensile stress of crystalline phase from around amorphous phase and therefore lead to occurrence of transgranular fracture and microcracks. This study suggests that rapid cooling to below 850°C should be avoided in order to obtain preferable mechanical properties for CaO-Al2O3-SiO2(ZnO-BaO-Na2O) glass ceramics.Copyright © 2010 by ASME