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By combining plasma-based ion implantation with unbalanced magnetron sputtering deposition, ion implantation mixed films were prepared on steel 45 substrate. X-ray photoelectron spectroscopy analysis shows that the concentrations of carbon and titanium have a periodical distribution in the prepared films. It comes from the periodical deposition and ion implantation process. The binding energy of C1s in the film varies with implantation depth, corresponding to the variation of the carbon distribution. It is found by glancing angle X-ray diffraction that TiC phase exists in the mixed films and the elemental titanium is not in a state of crystalline structure.