1. Corrosion in Solutions of Mineral Acids of Ti–B–N Thin Films Obtained by Reactive Magnetron Sputtering
- Author
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Nadezhda N. Dremova, A. A. Belmesov, G. V. Kalinnikov, I. I. Korobov, S. P. Shilkin, and A. V. Ivanov
- Subjects
Reactive magnetron ,Mineral ,Materials science ,020209 energy ,Organic Chemistry ,Metals and Alloys ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Titanium nitride ,Surfaces, Coatings and Films ,Corrosion ,Atmosphere ,chemistry.chemical_compound ,chemistry ,Chemical engineering ,Sputtering ,Cavity magnetron ,0202 electrical engineering, electronic engineering, information engineering ,Materials Chemistry ,Thin film ,0210 nano-technology - Abstract
The interaction of thin Ti–B–N films obtained by magnetron reactive sputtering of a TiB2 target was studied in an atmosphere of a gas argon–nitrogen mixture (85 vol % Ar + 15 vol % N2), with mineral acids (HCl, H2SO4, H3PO4, HNO3). It was found that the hexagonal boron nitride formed during the deposition process, along with titanium nitride, forms a resistant protective film that protects the bulk (~85%) of the film from corrosion.
- Published
- 2020