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Highlights: [•] Cr doped diamond like carbon (Cr-DLC) nanocomposite coatings were deposited by using a combined system. [•] The stress of the Cr-DLC coatings dramatically decreases from 0.98GPa to 0.49GPa as the Cr contents increases from 0at% to 9.7at%. [•] The results showed that Cr-DLC coating with low Cr concentration was a effective protective coating. [Copyright &y& Elsevier] more...

Abstract: Single-phase Zn0.95−x Cu x Li0.05O thin films have been prepared on Pt (111)/Ti/SiO2 substrates by reactive magnetron sputtering method. The XRD, XPS and absorption measurements confirmed the polycrystalline nature of the films and the substitution of Zn2+ by Cu2+ ions. The sputtered Zn0.90Cu0.05Li0.05O film shows multiferroic properties exhibiting a saturated ferroelectric loop with a remanent polarization of 6μC/cm2 and a saturated loop with a saturation magnetization of 0.43μB/Cu at room temperature. The origins of the ferromagnetism and ferroelectricity in these films are discussed. [Copyright &y& Elsevier] more...

TiN-containing amorphous Ti–Si–N (nc-TiN/a-Si3N4) nanocomposite coatings were deposited by using a modified closed field unbalanced middle frequency magnetron sputtering system which is arc assisted and consists of two circles of targets, at a substrate temperature of 400°C. The coatings exhibit good mechanical properties that are greatly influenced by the total gas pressure and N2/Ar ratios. For coatings prepared at a N2/Ar ratio of 3:1, the hardness increases from 24GPa at a total gas pressure of 0.2Pa–58GPa at 0.4Pa, and then, the hardness decreases gradually when the total gas pressure was further increased. On the other hand, the friction coefficient decreases monotonously with increasing total gas pressure. XRD, XPS and high resolution TEM experiments showed that the coatings contain TiN nanocrystals embedded in the amorphous Si3N4 matrix. The coating deposited under optimum conditions exhibits excellent tribological performance with a low friction coefficient of 0.42 and a high hardness of 58GPa. These properties make it possible for industrial applications. [Copyright &y& Elsevier] more...

Abstract: We report on the defects related room temperature ferromagnetic characteristics of Zn0.95–x Mn x Li0.05O (x =0.01, 0.03, 0.05 and 0.08) thin films grown on glass substrates using reactive magnetron sputtering. By increasing the Mn content, the films exhibited increases in the c-axis lattice constant, fundamental band gap energy, coercive field and remanent magnetization. Comparison of the structural and magnetic properties of the as-deposited and annealed films indicates that the hole carriers, together with defects concentrations, play an important role in the ferromagnetic origin of Mn and Li co-doped ZnO thin films. The ferromagnetism in films can be described by bound magnetic polaron models with respect to defect-bound carriers. [Copyright &y& Elsevier] more...

Abstract: An industrial scale cathodic arc assisted middle frequency magnetron sputtering system was introduced and Cr–Si–N nanocomposite coatings with various amounts of Si content have been synthesized. Energy dispersive spectroscope, X-ray diffraction, transmission electron microscopy, nanoindentation technique and friction measurement were employed to characterize the microstructure and mechanical properties of the coatings. The microstructure and hardness of the coatings were greatly influenced by the Si content. The nc-CrN/a-Si3N4 structure was formed in the coatings and exhibited a maximum hardness of 39.8GPa. The surfaces of the samples were smooth and the adhesion between the coating and substrate was higher than 50N. These properties make it possible for industrial applications. [Copyright &y& Elsevier] more...

Abstract: CrN films with deposition rates of 130–180nm/min were deposited on Si (111) and carbamide alloy substrates by an ion-source-enhanced middle frequency magnetron sputtering system. Increasing of ion source voltages promoted the growth of CrN films with preferred orientation of (200). The deposited CrN films are composed of nanocrystalline particles with sizes of ∼20nm embedded in polycrystalline matrix. The hardness of the CrN films increases from 1300Kg/mm2 without ion source bombardment to 2400Kg/mm2 with ion source voltages of 1000V. Origins for the increasing of hardness can be attributed to dislocation strengthening and densification effects. [Copyright &y& Elsevier] more...

Abstract: A middle-frequency (MF) unbalanced magnetron sputtering system equipped with an electron source was designed and used for deposition of CrN thick films under various MF power (1.4–14kW) at fixed temperature, pressure, and gas flow rate. The deposition rate was increased with increasing MF power and the structure and N/Cr ratio of the deposited CrN films exhibited a complicated behavior, where the CrN films were a polycrystalline structure and the films deposited under optimized conditions exhibited a dense columnar structure and a micro-hardness of 16GPa. The dependence of the structure and micro-hardness on MF power was interpreted by the power deposition efficiency. [Copyright &y& Elsevier] more...