1. Predicting scattering scanning near-field optical microscopy of mass-produced plasmonic devices.
- Author
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Otto, Lauren M., Burgos, Stanley P., Staffaroni, Matteo, Ren, Shen, Süzer, Özgün, Stipe, Barry C., Ashby, Paul D., and Hammack, Aeron T.
- Subjects
NANOELECTROMECHANICAL systems ,NEAR-field microscopy ,MAGNETIC recorders & recording ,ELECTRIC fields ,SIGNAL processing ,MAGNETOOPTICS - Abstract
Scattering scanning near-field optical microscopy enables optical imaging and characterization of plasmonic devices with nanometer-scale resolution well below the diffraction limit. This technique enables developers to probe and understand the waveguide-coupled plasmonic antenna in as-fabricated heat-assisted magnetic recording heads. In order to validate and predict results and to extract information from experimental measurements that is physically comparable to simulations, a model was developed to translate the simulated electric field into expected near-field measurements using physical parameters specific to scattering scanning near-field optical microscopy physics. The methods used in this paper prove that scattering scanning near-field optical microscopy can be used to determine critical sub-diffraction-limited dimensions of optical field confinement, which is a crucial metrology requirement for the future of nano-optics, semiconductor photonic devices, and biological sensing where the near-field character of light is fundamental to device operation. [ABSTRACT FROM AUTHOR]
- Published
- 2018
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