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Herein, the impact of cross‐temperature on 3D NAND flash memory is modeled by considering adjacent cells using machine learning. The cells comprising NAND flash memory exhibit diverse states and connectivity patterns. To effectively capture this complexity, the 3D NAND flash is converted to graph structure and the graph neural network (GNN) is leveraged, known for its exceptional performance in handling graph data. To the best of the authors' knowledge, this is the first attempt to model 3D NAND flash memory using GNN. This method has good generalization performance across various retention times and temperatures, achieving a remarkable overlap of 95.28% between ground truth and predicted distributions. Moreover, two applications of this method are introduced that contribute to the NAND flash memory improvement. One is a GNN‐assist program, which leverages well‐trained GNN to suppress the Vth$V_{\text{th}}$ degradation affected by cross‐temperature, resulting in reduced Vth$V_{\text{th}}$ shift and narrower Vth$V_{\text{th}}$ distribution width. The other is the sensitivity decomposition to identify parameters influencing the cell at cross‐temperature. It is found that cross‐temperature impact extends beyond physically connected cells to adjacent cells at close distances. Overall, this work provides valuable insights into modeling 3D NAND flash memory using GNNs and offers practical methods for enhancing NAND flash memory reliability. [ABSTRACT FROM AUTHOR]

Herein, the impact of cross‐temperature on 3D NAND flash memory is modeled by considering adjacent cells using machine learning. The cells comprising NAND flash memory exhibit diverse states and connectivity patterns. To effectively capture this complexity, the 3D NAND flash is converted to graph structure and the graph neural network (GNN) is leveraged, known for its exceptional performance in handling graph data. To the best of the authors' knowledge, this is the first attempt to model 3D NAND flash memory using GNN. This method has good generalization performance across various retention times and temperatures, achieving a remarkable overlap of 95.28% between ground truth and predicted distributions. Moreover, two applications of this method are introduced that contribute to the NAND flash memory improvement. One is a GNN‐assist program, which leverages well‐trained GNN to suppress the Vth degradation affected by cross‐temperature, resulting in reduced Vth shift and narrower Vth distribution width. The other is the sensitivity decomposition to identify parameters influencing the cell at cross‐temperature. It is found that cross‐temperature impact extends beyond physically connected cells to adjacent cells at close distances. Overall, this work provides valuable insights into modeling 3D NAND flash memory using GNNs and offers practical methods for enhancing NAND flash memory reliability.

A machine learning (ML) method was used to optimize the trap distribution of the charge trap nitride (CTN) to simultaneously improve its performance/reliability (P/R) characteristics, which are tradeoffs in 3-D NAND flash memories. Using an artificial neural network (ANN), we modeled the relationship between trap distributions and P/R characteristics. The ANN was trained using a large experimentally-calibrated technology computer-aided design (TCAD) simulation dataset. The gradient descent method was adapted to optimize the trap distribution, achieving the best P/R characteristics based on the well-trained ANN. Eventually, we found the best trap profile distributed in both space and energy. In particular, the energetic trap distribution had a larger impact on the P/R characteristics than that of the spatial trap distribution. Furthermore, in terms of the P/R characteristics, it was generally preferable to increase all inputs of the energetic trap distribution. However, the acceptor-like trap energy level ( $E_{TA}$ ) and its standard deviation ( $\sigma _{EA}$ ) caused a tradeoff between P/R characteristics; therefore, ML was used to determine their optimal points. The proposed ML method allows the optimization of trap distribution to obtain the best P/R characteristics rapidly and quantitatively. Our findings could be used as a guideline for determining the physical properties of CTN in 3-D NAND flash cells.

A machine-learning (ML) technique was used to optimize the energetic-trap distributions of nano-scaled charge trap nitride (CTN) in 3D NAND Flash to widen the threshold voltage (Vth) window, which is crucial for NAND operation. The energetic-trap distribution is a critical material property of the CTN that affects the Vth window between the erase and program Vth. An artificial neural network (ANN) was used to model the relationship between the energetic-trap distributions as an input parameter and the Vth window as an output parameter. A well-trained ANN was used with the gradient-descent method to determine the specific inputs that maximize the outputs. The trap densities (NTD and NTA) and their standard deviations (σTD and σTA) were found to most strongly impact the Vth window. As they increased, the Vth window increased because of the availability of a larger number of trap sites. Finally, when the ML-optimized energetic-trap distributions were simulated, the Vth window increased by 49% compared with the experimental value under the same bias condition. Therefore, the developed ML technique can be applied to optimize cell transistor processes by determining the material properties of the CTN in 3D NAND Flash. [ABSTRACT FROM AUTHOR]

• Neural networks (NNs) were proposed for predicting V T of NAND flash memories at cross-temperature. • Two different types of NNs were used for accurate prediction. • Quantitative and visual evaluations performed to verify the performance of the trained NNs. • Application of NNs can contribute to improving the reliability of NAND flash memory by capturing the V T distribution at cross-temperature. In this study, a neural network (NN) was proposed for predicting the V T characteristics of NAND flash memories under cross-temperature conditions. The training data were obtained from commercial NAND flash memory chip measurements at various temperatures. The V T distribution shift caused by cross-temperature was accurately predicted by investigating the optimum data dimensions while minimizing the data generation process. Two types of NNs were used to achieve an accurate V T distribution prediction, and each network was optimized using specific parameters based on the data characteristics at various program verify levels. Finally, quantitative and visual evaluations were conducted to verify the performance of the trained NNs. When the program-measured temperature varied from low to high, the NNs achieved mean errors of 1.87%, 1.41% at low and 0.34%, 0.77% at high for the average and width of the V T distribution, respectively. Similarly, when the temperature varied from high to low, the corresponding mean errors were 2.01%, 0.74% at high and 0.23%, 1.59% at low. These findings demonstrate that NNs can minimize the procedures for detecting the V T distribution shift caused by cross-temperature, thereby offering a promising approach to enhance reliability in the presence of such effects. [ABSTRACT FROM AUTHOR]

A machine-learning (ML) technique was used to optimize the energetic-trap distributions of nano-scaled charge trap nitride (CTN) in 3D NAND Flash to widen the threshold voltage (Vth) window, which is crucial for NAND operation. The energetic-trap distribution is a critical material property of the CTN that affects the Vth window between the erase and program Vth. An artificial neural network (ANN) was used to model the relationship between the energetic-trap distributions as an input parameter and the Vth window as an output parameter. A well-trained ANN was used with the gradient-descent method to determine the specific inputs that maximize the outputs. The trap densities (NTD and NTA) and their standard deviations (σTD and σTA) were found to most strongly impact the Vth window. As they increased, the Vth window increased because of the availability of a larger number of trap sites. Finally, when the ML-optimized energetic-trap distributions were simulated, the Vth window increased by 49% compared with the experimental value under the same bias condition. Therefore, the developed ML technique can be applied to optimize cell transistor processes by determining the material properties of the CTN in 3D NAND Flash.