1. Gate-Induced Threshold Voltage Instabilities in p-Gate GaN HEMTs.
- Author
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Oeder, Thorsten and Pfost, Martin
- Subjects
- *
THRESHOLD voltage , *GALLIUM nitride , *ELECTRON traps , *MODULATION-doped field-effect transistors , *SEMICONDUCTOR devices , *LOGIC circuits - Abstract
In this study, we investigate the threshold voltage (${V} _{{{ \text {th}}}}$) instability of p-gate GaN HEMTs induced by gate bias. Experimental results are acquired by a custom pulse setup for two commercially available devices with an ohmic gate and a Schottky gate. A transient drain current change is observed, which corresponds to a shift of ${V} _{{{ \text {th}}}}$. A negative ${V} _{{{ \text {th}}}}$ instability is identified for the ohmic gate, a mostly positive for the Schottky gate that can also become negative depending on the gate bias voltage and duration. The impact of the gate-bias-induced ${V} _{{{ \text {th}}}}$ instability on the Schottky-gate device is significantly higher compared to the ohmic-gate device, but clearly noticeable at the nominal rated ON-state gate voltage for both devices. Electron depletion and trapping as well as hole accumulation and trapping are identified to cause this transient ${V} _{{{ \text {th}}}}$ instability. [ABSTRACT FROM AUTHOR]
- Published
- 2021
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