1. Step-confined thin film growth via near-surface atom migration
- Author
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Caixia Meng, Rentao Mu, Yuan Chang, Qiang Fu, Rongtan Li, Junfeng Gao, Xinhe Bao, and Yanxiao Ning
- Subjects
Materials science ,Graphene ,02 engineering and technology ,Substrate (electronics) ,010402 general chemistry ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Atomic and Molecular Physics, and Optics ,0104 chemical sciences ,Carbide ,law.invention ,Overlayer ,Low-energy electron microscopy ,chemistry.chemical_compound ,chemistry ,Chemical physics ,Tungsten carbide ,law ,General Materials Science ,Density functional theory ,Electrical and Electronic Engineering ,Thin film ,0210 nano-technology - Abstract
Understanding of thin film growth mechanism is crucial for tailoring film growth behaviors, which in turn determine physicochemical properties of the resulting films. Here, vapor-growth of tungsten carbide overlayers on W(110) surface is investigated by real time low energy electron microscopy. The surface growth is strongly confined by surface steps, which is in contrast with overlayer growth crossing steps in a so-called carpet-like growth mode for example in graphene growth on metal surfaces. Density functional theory calculations indicate that the step-confined growth is caused by the strong interaction of the forming carbide overlayer with the substrate blocking cross-step growth of the film. Furthermore, the tungsten carbide growth within each terrace is facilitated by the supply of carbon atoms from near-surface regions at high temperatures. These findings suggest the critical role of near-surface atom diffusion and step confinement effects in the thin film growth, which may be active in many film growth systems.
- Published
- 2020
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