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We present the results of the calibration of a channeltron-based electrostatic analyzer operating in time-of-flight mode (ESA-ToF) using tin ions resulting from laser-produced plasma, over a wide range of charge states and energies. Specifically, the channeltron electron multiplier detection efficiency and the spectrometer resolution are calibrated, and count rate effects are characterized. With the obtained overall response function, the ESA-ToF is shown to accurately reproduce charge-integrated measurements separately and simultaneously obtained from a Faraday cup (FC), up to a constant factor the finding of which enables absolute cross-calibration of the ESA-ToF using the FC as an absolute benchmark. Absolute charge-state-resolved ion energy distributions are obtained from ns-pulse Nd:YAG-laser-produced microdroplet tin plasmas in a setting relevant for state-of-the-art extreme ultraviolet nanolithography. [ABSTRACT FROM AUTHOR]

We present a calibrated spectrum in the 5.5–265.5 nm range from a microdroplet-tin Nd:YAG-laser-produced plasma under conditions relevant for the production of extreme ultraviolet (EUV) light at 13.5 nm for nanolithography. The plasma emission spectrum obtained using a custom-built transmission grating spectrometer results from a careful calibration of a series of filters enabling measurements free of any higher diffraction orders. Specifically, Zr, Si, and Al thin-foil filters and bulk LiF, MgF2, and UV fused silica filters are employed. A further filter using four SiC mirrors is used to record the otherwise inaccessible 40–100 nm range. The resulting corrected and concatenated spectra are shown to accurately match in their respective overlap regions. The possibility to measure spectra over this broad range enables the optimization of current and future sources of EUV light for nanolithography by providing the diagnostics required for minimizing the emission of unwanted wavelength bands. [ABSTRACT FROM AUTHOR]

Emission spectra from multiply-charged Sn5+–Sn10+ ions are recorded from an electron beam ion trap (EBIT) and from laser-produced plasma (LPP) in the extreme ultraviolet range relevant for nanolithographic applications. Features in the wavelength regime between 12.6 and 20.8 nm are studied. Using the Cowan code, emission line features of the charge-state-resolved Sn ion spectra obtained from the EBIT are identified. Emission features from tin LPP either from a liquid micro-droplet or planar solid target are subsequently identified and assigned to specific charge states using the EBIT data. For the planar solid tin target, the 4d–5p transitions of Sn8+–Sn10+ ions are shown to dominate the long-wavelength part of the measured spectrum and transitions of type 4d–4f + 4p–4d are visible in absorption. For the droplet target case, a clear increase in the charge state distribution with increasing laser intensity is observed. This qualitatively demonstrates the potential of using long-wavelength out-of-band emission features to probe the charge states contributing to the strong unresolved transition array at 13.5 nm relevant for nanolithography. [ABSTRACT FROM AUTHOR]

Extreme ultraviolet (EUV) lithography is currently entering high-volume manufacturing to enable the continued miniaturization of semiconductor devices. The required EUV light, at 13.5 nm wavelength, is produced in a hot and dense laser-driven tin plasma. The atomic origins of this light are demonstrably poorly understood. Here we calculate detailed tin opacity spectra using the Los Alamos atomic physics suite ATOMIC and validate these calculations with experimental comparisons. Our key finding is that EUV light largely originates from transitions between multiply-excited states, and not from the singly-excited states decaying to the ground state as is the current paradigm. Moreover, we find that transitions between these multiply-excited states also contribute in the same narrow window around 13.5 nm as those originating from singly-excited states, and this striking property holds over a wide range of charge states. We thus reveal the doubly magic behavior of tin and the origins of the EUV light. Extreme ultraviolet (EUV) light is entering use in nanolithography. Here the authors discuss experimental and theoretical results about the prominent role of multiply-excited states in highly charged tin ions in the mechanism of EUV light emission from laser-produced plasma. [ABSTRACT FROM AUTHOR]

Experimental scaling relations of the optical depth are presented for the emission spectra of a tin-droplet-based, 1-μm-laser-produced plasma source of extreme-ultraviolet (EUV) light. The observed changes in the complex spectral emission of the plasma over a wide range of droplet diameters (16–65 μm) and laser pulse durations (5–25 ns) are accurately captured in a scaling relation featuring the optical depth of the plasma as a single, pertinent parameter. The scans were performed at a constant laser intensity of 1.4 × 1011 W/cm2, which maximizes the emission in a 2% bandwidth around 13.5 nm relative to the total spectral energy, the bandwidth relevant for industrial EUV lithography. Using a one-dimensional radiation transport model, the relative optical depth of the plasma is found to linearly increase with the droplet size with a slope that increases with the laser pulse duration. For small droplets and short laser pulses, the fraction of light emitted in the 2% bandwidth around 13.5 nm relative to the total spectral energy is shown to reach high values of more than 14%, which may enable conversion efficiencies of Nd:YAG laser light into—industrially—useful EUV radiation rivaling those of current state-of-the-art CO2-laser-driven sources. [ABSTRACT FROM AUTHOR]

The afterglow emission from Nd:YAG-laser-produced microdroplet-tin plasma is investigated, with a focus on analyzing Stark effect phenomena and the dynamical evolution of the plasma. Time- and space-resolved optical imaging spectroscopy is performed on 11 lines from Sn i-iv ions, in the 315-425-nm wavelength range. Stark shift-to-width ratios serve as the basis for unambiguous experimental tests of atomic physics theory predictions. Experiment and theory, where available, are found to be in poor agreement, and are in disagreement regarding the sign of the ratio in several cases. Spectroscopic measurements of the Stark widths in tandem with Saha-Boltzmann fits to Sn i and Sn ii lines, establish the evolution of the local temperature and density of the plasma afterglow, 20-40 ns after the end of the 15-ns-long temporally box-shaped laser pulse. A clear cool-down from ~2 to 1 eV is observed of the plasma in this time window, having started at ~30 eV when emitting extreme-ultraviolet (EUV) light. An exponential reduction of the density of the plasma from ~1018-1017e- cm-3 is observed in this same time window. Our work is relevant for understanding the dynamics of the decaying, expanding plasma in state-of-the-art EUV nanolithography machines. [ABSTRACT FROM AUTHOR]