1. High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography
- Author
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Edik U. Rafailov, Elmina Kabouraki, Andrius Melninkaitis, Konstantina Tourlouki, Maria Farsari, Nikolaos Kehagias, Vasileia Melissinaki, Georgios D. Barmparis, Theodoros Tachtsidis, Dimitris G. Papazoglou, and Amit Yadav
- Subjects
Photon ,Materials science ,QC1-999 ,laser damage ,3D printing ,02 engineering and technology ,01 natural sciences ,law.invention ,010309 optics ,diffractive optical elements ,law ,0103 physical sciences ,Nano ,additive manufacturing ,micro-optical elements ,nano-imprint lithography ,Electrical and Electronic Engineering ,Lithography ,3d printing ,business.industry ,Physics ,021001 nanoscience & nanotechnology ,Laser ,Atomic and Molecular Physics, and Optics ,Electronic, Optical and Magnetic Materials ,Laser damage ,Optoelectronics ,0210 nano-technology ,business ,Biotechnology - Abstract
Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.
- Published
- 2021