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To realize stable negative ion beams for 100 s required in the neutral beam injector of JT-60SA, a physical model to control cesium (Cs) distribution inside the negative ion source has been developed in order to maintain the stable negative ion production at the plasma grid (PG) surface with Cs. In this work, to quantitatively evaluate Cs coverage on the PG, a three-dimensional Cs transportation code was introduced to consider the spatial Cs distribution in the source. The spatial temperature distribution of the chamber wall was also introduced in this model. As a result, the reasonable variation of the Cs coverage for 100 s was obtained, compared to that in the initial model. Based on the modified model, the operational temperature of the chamber wall was proposed to be less than 60 °C to suppress the desorption of Cs in the chamber wall and to sustain the stable negative ion production. In addition, it was also suggested that a slightly higher wall temperature before the operation leads to a decrease in the amount of Cs stored at the chamber wall, resulting in suppression of Cs consumption in the ion source. [ABSTRACT FROM AUTHOR]

Vacuum insulation on a large size negative ion accelerator with multiple extraction apertures and acceleration grids for fusion application was experimentally examined and designed. In the experiment, vacuum insulation characteristics were investigated in the JT-60 negative ion source with >1000 apertures on the grid with the surface area of ∼2 m2. The sustainable voltages varied with a square root of the gap lengths between the grids, and decreased with number of the apertures and with the surface area of the grids. Based on the obtained results, the JT-60SA (super advanced) negative ion source is designed to produce 22 A, 500 keV D- ion beams for 100 s. [ABSTRACT FROM AUTHOR]

In JAEA, research and developments to realize high power accelerator (1 MeV, 40 AD- ion beams for 3600 s) for ITER have been carried out experimentally and numerically utilizing a five stage MAMuG (Multiaperture, Multigrid) accelerator. In this paper, the extension of the gap length, which is required to improve the voltage holding capability, is examined in two dimensional beam optics analyses and also from view point of stripping loss of ions. In order to suppress excess power loadings due to the direct interception of negative ions, which is issued in long pulse tests, the beamlet deflection is analyzed in three dimensional multibeamlet analyses. The necessary modifications shown above are applied to the MAMuG accelerator for coming long pulse tests in JAEA and ITER. [ABSTRACT FROM AUTHOR]

Abstract: This paper reports R&D progress of the MeV class accelerator, beam focussing technique and a high voltage (HV) bushing toward the ITER Neutral Beam system at JAEA. A H− ion beam of 320mA (current density: 140A/m2) was successfully accelerated up to 796keV by fixing air leak in the ion source chamber caused by heat loading due to backstream positive ions. From analyses of a three-dimensional beam trajectory, a countermeasure against beamlet deflection due to space charge repulsion among beamlets was identified to compensate the deflection by proper aperture offset in the electron suppression grid. For development of the HV bushing, a half-size (Ø800mm) mockup single stage bushing was manufactured and tested, that demonstrated the dc voltage holding capability of up to 220kV in a condition with vacuum inside. Electrostatic analyses and design of the HV bushing are in progress, in which some design improvements are suggested to reduce electric field strength on the surface of ceramic insulator. [Copyright &y& Elsevier]

Abstract: Negative ion implantation has been applied to polymers in order to modify the surface and to fabricate nanoparticles. Metal nanoparticles in the vicinity of a polymeric surface are promising for biomedical applications as well as nonlinear optical applications. Substrates of polymethyl methacrylate (PMMA) were implanted with Ag− and Cu− of 60 keV at 3 μA/cm2 up to 3×1017 ions/cm2. Optical absorption spectra of the implanted PMMA were measured in a photon range from 0.5 to 4.5 eV. A peak of surface plasmon resonance (SPR) emerges in the absorption spectra above about 1×1017 ions/cm2, both for the Ag− and Cu− cases. A coexisting absorption slope, due mostly to defects, increases but tends to saturate with ion fluence. The SPR peak of Ag-implanted PMMA is much broader than that of the Cu-implanted one. Corresponding to the SPR spectra, metal nanoparticles are observed by cross-sectional TEM. With increasing ion fluence, the Ag nanoparticles spread out towards the surface, in contrast to the localized Cu nanoparticles. The results demonstrate that metal nanoparticle fabrication in polymers is capable by using appropriate low-energy ions and provides a variety of spatial distributions dependent on ion species and fluence. In particular, Ag− ion implantation fabricates surface-exposed/gradient nanoparticles, which are suitable for biomedical applications such as anti-microbial effects. [Copyright &y& Elsevier]

Abstract: Formation processes of nickel oxide (NiO) nanoparticles (NPs) in silica glass (SiO2) by implantation of 60keV Ni− ions combined with thermal oxidation are studied using cross-sectional transmission electron microscopy (XTEM) and Rutherford backscattering spectrometry. In as-implanted state, Ni metallic NPs form within the surface layer of ∼80nm thick. The mean depth 〈z〉 and the standard deviation 〈(Δz)2〉1/2 of Ni atom distribution determined by XTEM were 43 and 15nm, respectively. After the oxidation at 800°C for 1h, 〈z〉 and 〈(Δz)2〉1/2 became 47nm and 20nm, respectively, i.e. the distribution was almost the same except a small diffusional shift to the deeper region. Mean volume of Ni- and NiO-NPs after heat treatments at 800°C were 27 and 43nm3, respectively. The larger mean volume of NiO-NPs is explained from the fact that NiO-NPs include both Ni and O atoms, i.e. approximately 2N atoms, while Ni-NPs include Ni atoms only, i.e. N atoms. Both the Ni- and NiO-NPs include 2.4×103 Ni atoms per NP in average. These results indicate that NiO-NPs are formed by oxidation of Ni-NPs without pronounced redistribution of Ni atoms. [Copyright &y& Elsevier]

Focuses on a negative ion based neutral beam injection for JT-60. Components of extractor of negative ions; Optimization of operation parameters of the ion source; Heat loads measured in the ion source and beamline; Difference between hydrogen and deuterium beams; Power flow diagram.

A multiaperture multigrid accelerator called “MeV accelerator” has been developed for neutral beam injection system of international thermonuclear experimental reactor. In the present work, long pulse H- ion beam acceleration was performed by the MeV accelerator equipped with new water-cooled grids. At present, the pulse length was extended to 5 s for the beams of 750 keV, 221 mA, and 10 s for the beams of 600 keV, 158 mA. Energy density, defined as products of beam energy (keV), current (mA), and pulse (s) divided by aperture area (m2), increased more than one order of magnitude higher compared with original MeV accelerator without water cooling in its grids. At higher energy and current, the grid was melted by beam deflection. Due to this grid melting, breakdowns occurred between the grids, and hence, the pulse length was limited. Beam deflection will be compensated by aperture displacement in next experiment. [ABSTRACT FROM AUTHOR]

Heat load on acceleration grids by secondary particles such as electrons, neutrals, and positive ions, is a key issue for long pulse acceleration of negative ion beams. Complicated behaviors of the secondary particles in multiaperture, multigrid (MAMuG) accelerator have been analyzed using electrostatic accelerator Monte Carlo code. The analytical result is compared to experimental one obtained in a long pulse operation of a MeV accelerator, of which second acceleration grid (A2G) was removed for simplification of structure. The analytical results show that relatively high heat load on the third acceleration grid (A3G) since stripped electrons were deposited mainly on A3G. This heat load on the A3G can be suppressed by installing the A2G. Thus, capability of MAMuG accelerator is demonstrated for suppression of heat load due to secondary particles by the intermediate grids. [ABSTRACT FROM AUTHOR]

Voltage holding capability of JT-60 negative ion source that has a large electrostatic negative ion accelerator with 45 cm×1.1 m acceleration grids was experimentally examined and improved to realize 500 keV, 22 A, and 100 s D- ion beams for JT-60 Super Advanced. The gap lengths in the acceleration stages were extended to reduce electric fields in a gap between the large grids and at the corner of the support flanges from the original 4–5 to 3–4 kV/mm. As a result, the voltage holding capability without beam acceleration has been successfully improved from 400 to 500 kV. The pulse duration to hold 500 kV reached 40 s of the power supply limitation. [ABSTRACT FROM AUTHOR]

In the JT-60U negative-ion-based neutral beam injection system, the effect of negative ion and electron deflection by the plasma grid (PG) magnetic filter was studied. After a long-pulse operation of up to 19 s, a local melting was observed on the beamline near the ion source, facing the electron drift side of the PG magnetic field. It is confirmed that the experimental deflection of the negative-ion beam agrees well with the three-dimensional beam simulation result by taking account of the measured magnetic field. By using the code, it is found that some stripped electrons produced in the first acceleration gap pass through the down pitch of the multiple apertures in the next stage of acceleration grids, and then collide on the beamline around the melted location. [ABSTRACT FROM AUTHOR]

Abstract: Neutral beam (NB) injectors for JT-60 Super Advanced (JT-60SA) have been designed and developed. Twelve positive-ion-based and one negative-ion-based NB injectors are allocated to inject 30MW D0 beams in total for 100s. Each of the positive-ion-based NB injector is designed to inject 1.7MW for 100s at 85keV. A part of the power supplies and magnetic shield utilized on JT-60U are upgraded and reused on JT-60SA. To realize the negative-ion-based NB injector for JT-60SA where the injection of 500keV, 10MW D0 beams for 100s is required, R&Ds of the negative ion source have been carried out. High-energy negative ion beams of 490–500keV have been successfully produced at a beam current of 1–2.8A through 20% of the total ion extraction area, by improving voltage holding capability of the ion source. This is the first demonstration of a high-current negative ion acceleration of >1A to 500keV. The design of the power supplies and the beamline is also in progress. The procurement of the acceleration power supply starts in 2010. [Copyright &y& Elsevier]

Abstract: Kinetic processes of nanoparticle formation by ion implantation was studied for the insulators of a-SiO2, LiNbO3, MgO·2.4(Al2O3) and PMMA, either by changing ion flux or by using a co-irradiation technique of ions and photons. Under Cu-implantation of 60keV Cu−, nanoparticles spontaneously formed without thermal annealing, indicating radiation-induced diffusion of implants. The high-flux implantation caused instable behaviors of nanoparticle morphology in a-SiO2, LiNbO3 and PMMA, i.e. enhanced atomic rearrangement or loss of nanoparticles. The spinel MgO·2.4(Al2O3) also showed nanoparticle precipitation at 60keV, but the precipitation tendency is less than the others. Combined irradiation of 3MeV Cu ions and photons of 2.3eV or 3.5eV indicates that the electronic excitation during ion implantation significantly enhances nanoparticle precipitation, greatly depending on photon energy and fluence. The selectivity for photons can be applied to control nanoparticle precipitation. [Copyright &y& Elsevier]