1. Impact on image sticking of residual reactive mesogen in PS-VA mode
- Author
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舒克伦 Shu Ke-lun, 温 刚 Wen Gang, 李正强 Li Zheng-qiang, 赵 国 Zhao Guo, 梁瑞祥 Liang Rui-xiang, 高红茹 Gao Hong-ru, 贵丽红 Gui Li-hong, and 池宝林 Chi Bao-lin
- Subjects
Work (thermodynamics) ,Materials science ,Atomic force microscopy ,Ion density ,Signal Processing ,Mode (statistics) ,Nanotechnology ,Composite material ,Residual ,Instrumentation ,Electronic, Optical and Magnetic Materials ,Image (mathematics) - Abstract
Well known PS-VA technology has been extensively used for TV application, but the image sticking issue is still a concern. In order to improve the image sticking performance of PS-VA TV panel, the condition of both UV1 and UV2 process are investigated to find out the relationship between the residual amount of RM and the image sticking performance. It shows that the image sticking performance is related to the RM residual amount. As we know, ion density is a factor of image sticking issue. Based on analysis on the relationship between ion density and RM residual amount, we develop a new technology to reduce the image sticking issue in PS-VA mode. Furthermore, another method is provided in this work to improve the image sticking performance by designing a new LC host mixture which has lower residual amount of RM. The technical data is obtained including ion density data measured by Toyo 6254 and surface profile investigation by SEM and AFM.
- Published
- 2017
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