1. Evaluating mechanical properties of 100nm-thick atomic layer deposited Al2O3 as a free-standing film
- Author
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Junmo Kim, Donghwan Kim, Joon Hyung Shim, Sang Min Lee, Taek-Soo Kim, Byoung Ho Choi, and Junmo Koo
- Subjects
010302 applied physics ,Materials science ,Mechanical Engineering ,Metals and Alloys ,Modulus ,02 engineering and technology ,Dielectric ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Atomic layer deposition ,Mechanics of Materials ,0103 physical sciences ,Ultimate tensile strength ,Deposition (phase transition) ,General Materials Science ,Thin film ,Composite material ,0210 nano-technology ,Layer (electronics) ,Tensile testing - Abstract
Due to the reduced thickness of thin films formed via atomic layer deposition, analyzing their true mechanical properties is difficult. To overcome this drawback, tensile tests on free-standing alumina thin films floating on water were conducted to measure their mechanical properties. Tensile tests on alumina thin films formed at different deposition temperatures were also conducted; the results indicated that higher Young's modulus and the strength were obtained from thin films formed at higher deposition temperatures. Factors responsible for the variations in mechanical properties were investigated through analyses of the structure, density, and composition of the films.
- Published
- 2020