1. Analytical Model on the Threshold Voltage of p-Channel Heterostructure Field-Effect Transistors on a GaN-Based Complementary Circuit Platform.
- Author
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Niu, Xuerui, Hou, Bin, Yang, Ling, Zhang, Meng, Zhang, Xinchuang, Lu, Hao, Jia, Fuchun, Du, Jiale, Wu, Mei, Song, Fang, Wang, Chong, Ma, Xiaohua, and Hao, Yue
- Subjects
FIELD-effect transistors ,THRESHOLD voltage ,MOLE fraction ,DOPING agents (Chemistry) ,GALLIUM nitride films ,GALLIUM nitride ,INDIUM gallium zinc oxide ,DIFFUSION - Abstract
To realize the complementary circuit on the GaN-on-Si platform, an investigation of p-channel heterostructure field-effect transistors (p-HFETs) is necessary. In this study, an analytical model for the estimation of the threshold voltage (${V}_{\text {TH}}$) for GaN-based p-HFETs was developed. In this model, the impact of polarization charges at different interfaces, the influence of interface charges at oxide/GaN interface, as well as the out-diffusion effect of Mg dopant in the p-GaN layer were all taken into consideration for systematic exploration. Herein, GaN-based p-HFETs were fabricated to verify the relationship between the ${V}_{\text {TH}}$ and the thickness of the GaN channel layer by using the proposed model. The ${V}_{\text {TH}}$ model was further confirmed through TCAD simulations. The influences of the thickness of oxide layer, Mg doping concentration in p-GaN layer, and the Al mole fraction of AlxGa $_{{1}-{x}}\text{N}$ layer on ${V}_{\text {TH}}$ were also discussed in detail. The model serves as more accurate guidance for the optimization of such p-HFETs design and complementary circuits. [ABSTRACT FROM AUTHOR]
- Published
- 2022
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