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2 results on '"René Laval"'

1. Soft x-ray multilayer monochromator with improved resolution and low specular background

Author

Françoise Bridou, Christian Rémond, Alain Raynal, R. Barchewitz, Michel Fialin, F. Delmotte, Alain Bosseboeuf, Jean-Michel André, René Laval, Gwaénäelle Julie, Marie-Françoise Ravet, Gérard Soullié, and Rabah Benbalagh

Subjects
Photon, Fabrication, Chemistry, business.industry, Resolution (electron density), Grating, law.invention, Optics, law, Specular reflection, Photolithography, Reactive-ion etching, business, Spectroscopy, Monochromator
Abstract

A new soft-x-ray multilayer monochromator with an improved resolution and a low specular background is presented. The principles of the device, based on the use of a lamellar multilayer amplitude grating (LMAG), are summarized. The techniques of fabrication of the monochromator (multilayer deposition, UV lithography and reactive ion etching) are given. The performance of this new monochromator at photon energies around 1500 eV is demonstrated. Copyright © 2001 John Wiley & Sons, Ltd.

Published
2001
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2. Fabrication and characterization of a Mo/Si multilayer monochromator with a narrow spectral bandwidth in the xuv domain

Author

R. Barchewitz, Gwaénäelle Julie, P. Troussel, Françoise Bridou, René Laval, Rabah Benbalagh, F. Delmotte, Alain Raynal, Jean-Michel André, Alain Bosseboeuf, and Marie-Françoise Ravet

Subjects
Physics, Nuclear and High Energy Physics, Fabrication, business.industry, Synchrotron radiation, X-ray optics, Grating, law.invention, Optics, law, Extreme ultraviolet, Optoelectronics, Photolithography, Reactive-ion etching, business, Instrumentation, Monochromator
Abstract

A new kind of xuv multilayer monochromator with a narrow spectral bandwidth is introduced. This monochromator is based on a Mo/Si multilayer mirror etched according to the profile of a lamellar grating. The fabrication of such a device involving multilayer deposition, UV lithography and reactive ion etching is presented. The monochromator has been characterized by means of the synchrotron radiation around the Si–L edge (100 eV). A reduction of the bandwidth has been observed with respect to the unpatterned mirror by a factor close to 3.

Published
2001
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