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1. Ag-induced multistep formation on Si(001).

Author

Folsch, S. and Winau, D.

Subjects
*ARGON, *SILICON, *ELECTRON diffraction
Abstract

Examines the formation of argon-induced multistep on Silicon(001). Criterion for the orientational and structural film properties; Effects of residual substrate on the formation of particular domain orientations of the overlayer; Effect of the adsorption of submonolayer quantities of Argon on step structure.

Published
1995

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